Pump having an automated gas removal and fluid recovery system and method using a gas removal reservoir having an internal partition

ABSTRACT

A precision pump system having a motor driver for accurately and repeatedly delivering process fluid, (e.g., photo chemicals) using a pumping fluid with minimal process fluid loss to a fabrication process and whereby the motor driver can be easily and quickly replaced without interrupting the fluid flow path. This is accomplished with the use of a gas removal reservoir having at least one vertical partition therein and at least one free end near a top side of the gas removal reservoir where both the input and output to the gas removal reservoir are located on a bottom surface and a pumping fluid reservoir that are associated with the pump, either integrated with the pump or closely adjacent. In addition, this precision pump system can be remotely monitored, viewed and controlled over the Internet. In addition, trapped process fluid within a downstream filtering block can be recirculated to the gas removal reservoir when trapped gas in the filter is removed. Furthermore, a nitrogen gas source is connected to the gas removal reservoir via a valve in case a need to insert a gas is required. Alternative system embodiments are shown for recirculating process fluid back to the gas removal reservoir and/or the source line. Another alternative system has the pumping chamber coupled to the gas removal reservoir input.

CROSS-REFERENCE TO RELATED APPLICATIONS

This continuation-in-part application claims the benefit under 35 U.S.C. § 120 of application Ser. No. 14/202,831 filed on Mar. 10, 2014, entitled PUMP HAVING AN AUTOMATED GAS REMOVAL AND FLUID RECOVERY SYSTEM AND METHOD which in turn claims the benefit of 35 U.S.C. § 119(e) of Provisional Application Ser. No. 61/789,217 filed on Mar. 15, 2013 entitled PUMP HAVING A QUICK CHANGE MOTOR DRIVE SYSTEM and all of whose entire disclosures are incorporated by reference herein.

BACKGROUND OF THE INVENTION

The present invention relates generally to apparatus used in metering fluids with high precision, particularly in fields such as semiconductor manufacturing.

Many of the chemicals used in manufacturing integrated circuits, photomasks, and other devices with very small structures are corrosive, toxic and expensive. One example is photoresist, which is used in photolithographic processes. In such applications, both the rate and amount of a chemical in liquid phase—also referred to as process fluid or “chemistry”—that is dispensed onto a substrate must be very accurately controlled to ensure uniform application of the chemical and to avoid waste and unnecessary consumption. Furthermore, purity of the process fluid is often critical. Even the smallest foreign particles contaminating a process fluid cause defects in the very small structures formed during such processes. The process fluid must, therefore, be handled by a dispensing system in a manner that avoids contamination. See, for example, Semiconductor Equipment and Material International, “SEMI E49.2-0298 Guide for High Purity Deionized Water and Chemical Distribution Systems in Semiconductor Manufacturing Equipment” (1998). Improper handling can also result in introduction of gas bubbles and damage the chemistry. For these reasons, specialized systems are required for storing and metering fluids in photolithography and other processes used in fabrication of devices with very small structures.

Chemical distribution systems for these types of applications therefore must employ a mechanism for pumping process fluid in a way that permits finely controlled metering of the fluid and avoids contaminating and/or reacting with the process fluid. Generally, a pump pressurizes process fluid in a line to a dispense point. The fluid is drawn from a source that stores the fluid, such as a bottle or other container. The dispense point can be a small nozzle or other opening. The line from the pump to a dispense point on a manufacturing line is opened and closed with a valve. The valve can be placed at the dispense point. Opening the valve allows process fluid to flow at the point of dispense. A programmable controller operates the pumps and valves. All surfaces within the pumping mechanism, lines and valves that touch the process fluid must not react with or contaminate the process fluid. The pumps, containers of process fluid, and associated valving are sometimes stored in a cabinet that also house a controller.

Pumps for these types of systems are typically some form of a positive displacement type of pump, in which the size of a pumping chamber is enlarged to draw in fluid into the chamber, and then reduced to push it out. Types of positive displacement pumps that have been used include hydraulically actuated diaphragm pumps, bellows type pumps, piston actuated, rolling diaphragm pumps, and pressurized reservoir type pumping systems. U.S. Pat. No. 4,950,134 (Bailey et al.) is an example of a typical pump. It has an inlet, an outlet, a stepper motor and a fluid displacement diaphragm. When the pump is commanded electrically to dispense, the outlet valve opens and the motor turns to force flow of a displacement or actuating fluid into the actuating fluid chamber, resulting in the diaphragm moving to reduce the size the pumping chamber. Movement of the diaphragm forces process fluid out the pumping chamber and through the outlet valve.

Due to concerns over contamination, current practice in the semiconductor manufacturing industry is to use a pump only for pumping a single type of processing fluid or “chemistry.” In order to change chemistries being pumped, all of the surfaces contacting the processing fluid have to be changed. Depending on the design of the pump, this tends to be cumbersome and expensive, or simply not feasible. It is not uncommon to see processing systems that use up to 50 pumps in today's fabrication facilities.

A dispensing apparatus that supplies process chemicals from different sources is shown in U.S. Pat. No. 6,797,063 (Mekias). Here, the dispensing apparatus has two or more process chambers inside of a control chamber. The volume of the process chambers increases or decreases by adding control fluid to or removing control fluid from the control chamber. The use of valving at the inlets and outlets of the process chambers, in combination with a pressurized fluid reservoir that controls fluid into and out of the control chamber controls the flow of dispensed fluid through the process chambers.

One highly desirable feature of a precision pump not heretofore known is the ability to separate and remove components of the pump for maintenance or repair without breaking into the process fluid flow lines that are attached to one or more pump chamber heads. This would include avoiding opening of any seals in the process fluid flowpath either into, through, or out of the pump. U.S. Pat. No. 8,317,493 (Laessle, et al.), assigned to the same Assignee, namely, Integrated Designs L.P., as the present invention, discloses a precision pump system having just such a feature.

However, where a new pump motor needs to replace an existing motor, there remains a need to provide for immediate pumping fluid restoration and balancing within the pump head and pumping chamber, while not interrupting the process fluid flow and while minimizing the loss of any process fluid.

All references cited herein are incorporated herein by reference in their entireties.

BRIEF SUMMARY OF THE INVENTION

An automated pump system for removing gas from a process fluid to be dispensed is disclosed. The pump system comprises: a gas removal reservoir having a process fluid therein: at least one vertical partition that separates the reservoir into at least two sub-reservoirs having a fluid channel positioned at a free end portion of the at least one vertical partition for permitting process fluid to pass between the at least two sub-reservoirs; a first inlet coupled to a remote process fluid source; an outlet; a second inlet coupled to a process fluid recirculation path coupled to a drain; and at least one vent coupled to the drain; a driving means (e.g., a piston cylinder arrangement, pumping chamber, etc.) indirectly coupled to the outlet for driving the process fluid into or out of the gas removal reservoir; valves coupled to the inlet and to the outlet for permitting process fluid flow into and out of the gas removal reservoir, and coupled to the at least one vent to remove gas out of the gas removal reservoir and into the drain, and coupled to the second inlet for recirculating process fluid away from the drain and into the gas removal reservoir; a sensor (e.g., a pressure sensor, etc.) for providing a signal corresponding to a parameter in the pump system related to the presence of gas in the gas removal reservoir; and a processor coupled to the driving means, to the sensor and to the valves, and wherein the processor uses the signal to automatically control the valves and the driving means to force any gas in the gas removal reservoir through the at least one vent and into the drain.

An automated pump system for removing gas from a process fluid to be dispensed is disclosed. The pump system comprises: a gas removal reservoir having a process fluid therein: at least one vertical partition that separates the reservoir into at least two sub-reservoirs having a fluid channel positioned at a free end portion of the at least one vertical partition for permitting process fluid to pass between the at least two sub-reservoirs; a first inlet; an outlet; a second inlet coupled to a process fluid recirculation path coupled to a drain; and at least one vent coupled to the drain; a driving means (e.g., a piston cylinder arrangement, pumping chamber, etc.) coupled to the first inlet for driving the process fluid into and out of the gas removal reservoir, the outlet being coupled to a filter; valves coupled to the first inlet and to the outlet for permitting process fluid flow into and out of the gas removal reservoir, and coupled to the at least one vent to remove gas out of the gas removal reservoir and into the drain, and coupled to the second inlet for recirculating process fluid away from said drain and into said gas removal reservoir; a sensor (e.g., a pressure sensor, etc.) for providing a signal corresponding to a parameter in the pump system related to the presence of gas in the gas removal reservoir; and a processor coupled to the driving means, to the sensor and to the valves, and wherein the processor uses the signal to automatically control the valves and the driving means to force any gas in the gas removal reservoir through the at least one vent and into the drain.

A method for automatically removing gas from a process fluid to be dispensed is disclosed. The method comprising: (a) providing a gas removal reservoir having a first inlet coupled to a remote process fluid source, an outlet and at least one vent coupled to a drain, and wherein the gas removal reservoir has at least one vertical partition therein to form at least two sub-reservoirs that are in fluid communication via a fluid channel positioned at a free end of the at least one vertical partition; (b) indirectly coupling a driving means (e.g., a piston cylinder arrangement, pumping, chamber, etc.) to the outlet for driving the process fluid between the at least two sub-reservoirs and around the free end of the at least one vertical partition and out of the gas removal reservoir, and wherein the driving means is coupled to a remote process fluid source; (c) coupling valves to the first inlet and to the outlet for permitting the process fluid to flow into and out of the gas removal reservoir and coupling a valve to the at least one vent to remove gas out of the gas removal reservoir and into the drain, and coupling a second inlet to a process fluid recirculation path that is coupled to the drain and wherein the gas removal reservoir, the driving means and the valves form a system; (d) disposing a sensor (e.g., a pressure sensor, etc.) in the system and wherein the sensor provides a signal corresponding to a system parameter related to the presence of a gas in the gas removal reservoir; and (e) automatically controlling the driving means and the valves based on the signal received from the sensor, and wherein the automatic control forces any gas in the gas removal reservoir through the at least one vent and into the drain.

A method for automatically removing gas from a process fluid to be dispensed is disclosed. The method comprises: (a) providing a gas removal reservoir having a first inlet coupled to a remote process fluid source, an outlet and at least one vent coupled to a drain, said gas removal reservoir having at least one vertical partition therein to form at least two sub-reservoirs that are in fluid communication via a fluid channel positioned at a free end of said at least one vertical partition, said outlet being coupled to a filter input; (b) coupling a driving means (e.g., a piston cylinder arrangement, pumping chamber, etc.) to an inlet of said gas removal reservoir for driving the process fluid between said at least two sub-reservoirs and around said free end of said at least one vertical partition and out of said gas removal reservoir; (c) coupling valves to said inlet and to said outlet for permitting the process fluid to flow into and out of said gas removal reservoir and coupling a valve to said at least one vent to remove gas out of said gas removal reservoir and into the drain, and coupling a second inlet to a process fluid recirculation path that is coupled to the drain and wherein said gas removal reservoir, said driving means and said valves form a system; (d) disposing a sensor (e.g., a pressure sensor, etc.) in said system and wherein said sensor provides a signal corresponding to a system parameter related to the presence of a gas in the gas removal reservoir; and (e) automatically controlling said driving means and said valves based on said signal received from said sensor, said automatic control forcing any gas in said gas removal reservoir through said at least one vent and into the drain.

A method for automatically evacuating gas from a process fluid to be dispensed is disclosed. The method comprises: (a) providing a gas removal reservoir having a first inlet coupled to a remote process fluid source, an outlet and at least one vent coupled to a drain; (b) indirectly coupling a piston and cylinder arrangement to the outlet for driving the process fluid into and out of the gas removal reservoir, wherein the step of indirectly coupling a piston and cylinder arrangement further comprises providing a pumping chamber that dispenses a process fluid and wherein the pumping chamber comprises a diaphragm that separates the pumping chamber into first and second chambers and wherein the first chamber is in fluid communication with the piston and cylinder arrangement through a first valve for receiving a pumping fluid therein and wherein the second chamber is in fluid communication with the gas removal reservoir and wherein the second chamber dispenses the precise amount of the process fluid to a pump outlet in accordance with a volume displacement applied from the pumping fluid in the first chamber via the diaphragm; (c) coupling a second valve between a second chamber output and a filter input, coupling a third valve between a filter output and a recirculation flow path back to the gas removal reservoir via a second inlet, coupling a fourth valve between a filter vent and the drain and coupling a fifth valve between the at least one vent and said drain; and wherein the gas removal reservoir, the driving means and the valves form a system; (d) disposing a sensor (e.g., a pressure sensor, etc.) in the system and wherein the sensor provides a signal corresponding to a system parameter related to the presence of a gas in the gas removal reservoir; and (e) automatically controlling the piston and cylinder arrangement and the valves based on the signal received from the sensor, wherein the automatic control implements a gas evacuation routine comprising: (f)(1) detecting that the piston is at a reference position; (f)(2) if the piston is at the reference position, opening the first, second and third valves to displace the piston at a predetermined rate (e.g., 0.1 mL/sec, etc.) to build up pressure and if the piston is not at the reference position to move to perform a recharge operation of the piston and cylinder arrangement until the reference position is achieved; (f)(3) repeating step (f)(2) until a predetermined gas evacuation pressure is reached (e.g., 15 psi, etc.) and a predetermined volume displacement (e.g., 1.2 mL) of process fluid has occurred; (f)(4) opening the fourth and fifth valves for a predetermined time interval; (f)(5) closing the first, second and third valves; and (f)(6) performing the recharge operation of the piston and cylinder arrangement.

A method for automatically evacuating gas from a process fluid to be dispensed as part of a recirculation process is disclosed. The method comprises: (a) providing a gas removal reservoir having a first inlet coupled to a remote process fluid source, an outlet and at least one vent coupled to a drain; (b) indirectly coupling a piston and cylinder arrangement to the outlet for driving the process fluid into and out of the gas removal reservoir, and wherein the step of indirectly coupling a piston and cylinder arrangement further comprises providing a pumping chamber that dispenses a process fluid and wherein the pumping chamber comprises a diaphragm that separates the pumping chamber into first and second chambers and wherein the first chamber is in fluid communication with the piston and cylinder arrangement through a first valve for receiving a pumping fluid therein and wherein the second chamber is in fluid communication with the gas removal reservoir and wherein the second chamber dispenses the precise amount of the process fluid to a pump outlet in accordance with a volume displacement applied from the pumping fluid in the first chamber via the diaphragm; (c) coupling a second valve between the outlet and an input to the second chamber, coupling a third valve between a second chamber output and a filter input, coupling a fourth valve between a filter output and a recirculation flow path back to the gas removal reservoir via a second inlet, coupling a fifth valve between a filter vent and the drain, coupling a sixth valve between the at least one vent and the drain, and coupling a recirculation valve between the filter vent and the recirculation flow path; the gas removal reservoir, the driving means and the valves forming a system; (d) disposing a sensor (e.g., a pressure sensor, etc.) in the system and wherein the sensor provides a signal corresponding to a system parameter related to the presence of a gas in the gas removal reservoir; and (e) automatically controlling the piston and cylinder arrangement and the valves based on the signal received from the sensor, wherein the automatic control implements a gas evacuation routine as part of a process fluid recirculation process comprising: (f)(1) detecting that the piston is at a reference position; (f)(2) if the piston is at the reference position, opening the first, second, third and fourth valves to displace piston at a predetermined rate (e.g., 0.1 mL/sec, etc.) to build up pressure and if the piston is not at the reference position to move to perform a recharge operation of the piston and cylinder arrangement until the reference position is achieved; (f)(3) repeating step (f)(2) until a predetermined gas evacuation pressure (e.g., 15 psi, etc.) is reached and a predetermined volume displacement (e.g., 1.2 mL) of process fluid has occurred; (f)(4) opening the fifth, sixth and recirculation valves for a predetermined time interval; (f)(5) closing the first, second, third and fourth valves; and (f)(6) performing the recharge operation of the piston and cylinder arrangement.

BRIEF DESCRIPTION OF SEVERAL VIEWS OF THE DRAWINGS

The invention will be described in conjunction with the following drawings in which like reference numerals designate like elements and wherein:

FIG. 1 is a block diagram of the present invention coupled to an exemplary integrated circuit wafer fabrication process;

FIG. 2 are isometric views of the precision pump assembly of the present invention;

FIG. 3 is an exploded view of the precision pump assembly of the present invention;

FIG. 4 is an exploded view of the pump body;

FIG. 4A is an isometric view of the pump body showing the side that forms the pumping fluid reservoir;

FIG. 4B is an isometric view of the pump body showing the side that forms the pumping fluid chamber;

FIG. 5 are isometric views of the pump head and showing how it couples to the pump body;

FIG. 6 is an exploded view of the pump head;

FIG. 6A is an isometric view of the pump head block showing the process fluid chamber side of the pump head block;

FIG. 6B is an isometric view of the pump head block showing the gas removal reservoir (also referred to as the “gas removal reservoir”) and the side of the pump head block that mates with the valve plate;

FIG. 6C diagrammatically shows the gas removal reservoir inlet;

FIG. 7 is an exploded view of the filter distribution block;

FIG. 7A are front and back views of the assembled filter distribution block;

FIG. 8 is an exploded view of the motor drive system;

FIG. 8A is a plan view of the piston;

FIG. 8B is a cross-sectional view of the piston assembly taken along line 8B-8B of FIG. 8A

FIG. 9 are exploded and assembled views of the piston;

FIG. 10 is a cross-sectional view of the piston cylinder;

FIG. 11 are exploded and isometric views of the overall pump assembly;

FIG. 11A is an isometric view of the pump assembly showing internals of the pump in phantom and with the outer cover removed showing the connections of the various flare fittings;

FIG. 12 is an exemplary electrical wire harness (also referred to as pigtail) for use in the electronics of the present invention;

FIG. 13 is an exemplary syringe device for coupling to the present invention for adding air into the pumping fluid reservoir during the motor drive system change;

FIG. 13A is a block diagram of the remote monitoring, viewing and controlling (RMVC) subsystem pump interface using a web server;

FIG. 13B is a block diagram of the RMVC subsystem pump interface of FIG. 13A but using power-over-Ethernet (POE);

FIG. 13C is an exemplary web cam that can be used to view the pump and its vicinity over the RMVC using the web server in the system of FIG. 13B;

FIG. 13D is a block diagram of the RMVC subsystem pump interface of FIG. 13B but using POE and WiFi;

FIG. 13E is a block diagram of the network management module (NMM) interface;

FIG. 13F is a block diagram of the pump controller motherboard interfaces;

FIG. 13G is a block diagram of the Assignee's (Integrated Designs, L.P.) standard graphical user interface (GUI) for the pump;

FIG. 13H is a block diagram of the Assignee's standard GUI modified for Ethernet input/output;

FIG. 13I is a block diagram of the Assignee's standard GUI and pump over the Ethernet;

FIG. 13J is a block diagram of the Assignee's preferred cross-platform GUI, served JAVA applet;

FIG. 13K is a block diagram of the RMVC (also referred to as “Lynx”) which is a web-served cross platform GUI;

FIG. 13L is a table showing the JAVA supported platforms for use with the preferred GUI;

FIG. 14 is a circuit schematic of a conventional stepper motor H-bridge;

FIG. 15 block diagram of another embodiment of the present invention coupled to an exemplary integrated circuit wafer fabrication process that provides valving for filter recirculation of trapped process fluid and for a gas removal reservoir nitrogen supply;

FIG. 15A depicts a venturi circuit for use in the alternative embodiment of FIG. 15 to support filter recirculation of trapped process fluid;

FIG. 15B depicts a flow diagram for the filter vent recirculation process;

FIG. 16A is a flow diagram for the Recirculation mode using the embodiment according FIGS. 1-1A;

FIG. 16B is a flow diagram for the Recirculation mode using the embodiment according FIG. 15;

FIG. 17 is a flow diagram for the Auto Balance mode;

FIG. 18 is a flow diagram for the Dispense and Recharge modes;

FIG. 19 is a flow diagram for the Precharge mode;

FIG. 20 is a flow diagram for the Purge to Vent mode;

FIG. 21 is a flow diagram for the Purge to Output mode;

FIG. 22 is a flow diagram for the Prime Filter Housing mode;

FIGS. 23A-23B form a flow diagram for the Prime Filter Substrate mode;

FIGS. 24A-24B are flow diagrams for the System Drain mode using a two-filter block design;

FIGS. 24C-24D are flow diagrams for the System Drain mode using a four-valve filter block design;

FIG. 25A is a flow diagram for the Out of the Box mode using a two-filter block design;

FIG. 25B is a flow diagram for the Out of the Box mode using a four-filter block design;

FIG. 26 is the flow diagram for the Changing Drive Assembly mode;

FIGS. 27A-27B form a flow diagram for the Gas in Filter Detection Algorithm;

FIGS. 28A-28B form the flow diagram for the Gas in Piston Chamber Detection Algorithm;

FIGS. 29A-29B form the flow diagram for the Gas Volume in Gas removal reservoir Detection Algorithm;

FIG. 30 is a block diagram of the major features of the present invention;

FIG. 31 depicts an alternative configuration of the pump of the present invention wherein the filter is located before the gas removal reservoir and the recirculation is located upstream of the filter;

FIG. 32 depicts another alternative configuration of the pump of the present invention wherein the filter is located after the gas removal reservoir and the recirculation is located either upstream of the gas removal reservoir or downstream of the gas removal reservoir;

FIG. 33 depicts another alternative configuration of the pump of the present invention wherein the filter is located before the gas removal reservoir and where the recirculation is located downstream of the filter;

FIG. 34A depicts a first gas evacuation process (also referred to as “GASE5”) whereby pressure is built up within the pump system and then a quick vent is performed to evacuate any air in the system as used during a portion of the Recharge routine;

FIG. 34B depicts a second gas evacuation process (also referred to as “GASE6”) whereby pressure is again built up within the pump system and then a quick vent is performed to evacuate any air in the system as used during a portion of the recirculation routine;

FIG. 35 depicts a further alternative configuration of the pump of the present invention wherein the gas removal reservoir (i.e., gas removal reservoir or gas removal reservoir) comprises at least one internal partition and wherein the filter block has been replaced with an integrated configuration;

FIG. 35A depicts a functional diagram of the gas removal reservoir having an internal partition to facilitate the separation and removal of gas from the process fluid;

FIG. 35B depicts a functional diagram of an alternative embodiment of the gas removal reservoir that uses a plurality of internal partitions to facilitate the separation and removal of gas from the process fluid;

FIG. 35C depicts a venturi circuit for use in the alternative system configuration of FIG. 34 to support filter recirculation of trapped process fluid;

FIGS. 36A-36D depict different views of the alternative system embodiment that uses a gas removal reservoir with at least one internal partition and showing the precision pump and its corresponding electrical control box;

FIG. 37 is an exploded view depicting the internals of the pump of FIGS. 36A-36D;

FIGS. 38A-38B depict opposite side perspective views of the pump head of the pump of FIGS. 36A-36D;

FIG. 38C depicts the alignment for coupling the pump head with the pump assembly of FIGS. 36A-36D;

FIGS. 38D-38F depict the coupling of the pump assembly and pump head of FIGS. 36A-36D in more detail.

FIG. 39 is an exploded view of the pump head of the pump of FIGS. 36A-36D depicting the internal components;

FIG. 40A is an isometric view of the pump head block of the pump of FIGS. 36A-36D showing the process fluid chamber side of the block;

FIG. 40B is an isometric view of the pump head block showing the valve side of the pump head block of the pump of FIGS. 36A-36D that mates with the valve plate;

FIG. 40C is an enlarged perspective view of the pump head block of the pump of FIGS. 36A-36D diagrammatically showing the gas removal reservoir inlet;

FIG. 41 is a functional diagram showing how the pump head of the pump of FIGS. 36A-36D interfaces with the filter 42;

FIG. 42 depicts another embodiment of the pump system which utilizes a filter vent-to-source line flow path having an apex and vent positioned thereat for venting air bubbles;

FIG. 43 depicts a further embodiment of the pump system which utilizes a filter vent-to-source line flow path having an apex with a bubble sensor and valve positioned thereat and also includes a vent path back to the filter drain; and

FIG. 44 depicts a further pump system wherein the input to the gas removal reservoir is fed from the pumping chamber.

DETAILED DESCRIPTION OF THE INVENTION

The invention will be illustrated in more detail with reference to the following embodiments, but it should be understood that the present invention is not deemed to be limited thereto.

Referring now to the drawings, wherein like part numbers refer to like elements throughout the several views, there is shown a block diagram of an exemplary embodiment of the present invention 20 that uses a precision pump system. The present invention 20 may form a portion of an integrated circuit wafer fabrication process, by way of example only, for dispensing a precise amount of process fluid to the wafer fabrication. As shown in FIG. 1, the present invention 20 is coupled to fabrication equipment, e.g., a fabrication reservoir FR which in turn is connected to a BIB (“bag in bottle” which supplies process fluid to the fabrication reservoir); a vent/drain is connected to the fabrication reservoir FR via a valve, V_(FAB).

As shown in FIGS. 1-2, the present invention 20 comprises a precision pump system 22 which includes a motor drive system 24 (e.g., Allegro A3977SED stepper motor driver and Portescape PK264-E2.0A stepper motor) that drives a piston 26 within a piston cylinder or chamber 28. The precision pump 22 drives a pumping fluid (e.g., ethylene glycol or any other similar liquid that comprises similar characteristics, such as vapor pressure, boiling point, etc. that remains in its liquid state during all aspects of present invention's operation). The pumping fluid is also referred to as the “working” fluid because of how it interacts with the piston 26 and the operation of the pump 20 as a whole. The pumping fluid is provided from a pumping fluid reservoir 32 (e.g., 33 mL capacity) associated with the precision pump system 22. The pumping fluid is used to drive and deliver a process fluid (e.g., photoresist) to the exemplary wafer fabrication process. The process fluid is provided from a gas removal reservoir 30 (e.g., having an exemplary capacity of 33-34 mL). The process fluid is a premium fluid and minimizing its waste is one of the key features of the present invention 20 which is to deliver precise amounts (e.g., maximum of 11 mL) of this process fluid without wasting it. To accomplish this delivery of the process fluid, both the pumping fluid and the process fluid are delivered to a working chamber 34 that comprises a pumping chamber 34A (e.g., 11-13 mL capacity) and a dispense chamber 34B (e.g., 11-13 mL capacity, and also referred to as “process fluid chamber”) which are formed by the presence of a diaphragm 36 that divides the working chamber 34 into the two variable sized chambers 34A/34B. Thus, the two fluids do not come into contact with each other and when the piston 26 is pressurizing the pumping fluid within the pumping chamber 34A, the corresponding pressure is conveyed through the diaphragm 36 to the process fluid present in the process fluid chamber 34B. The process fluid is then conveyed to filter distribution block 40 which comprises a filter 42 for filtering the process fluid before dispensing it to the application.

It should be noted that a pump controller 38, as will be discussed in detail later, controls a motor drive assembly 24E for displacing the piston 26; the motor drives the piston 26 based on pressure readings of the piston chamber 28 using a pressure sensor PS. Since the pump controller 38 knows the rate at which the piston 26 moves, as well as the time required to displace a desired volume of fluid, the precise amount of fluid dispensed is known.

It should also be understood that the presence of the associated pumping fluid reservoir 32 and the gas removal reservoir 30 form two key elements of the present invention 20. By having the pumping fluid reservoir associated with the precision pump 22, the present invention 20 is able to accomplish a quick replacement of the motor drive system while the pump remains online during the switch out. In addition, by having the gas removal reservoir 30 associated with the precision pump 22, dispensed process fluid contains no gas bubbles and hence the phrase “gas removal reservoir” 30. These reservoirs also permit the quick priming of the precision pump 22 and the filter distribution block 40 for the newly-inserted motor drive 24. It should be understood that the location of either of these two associated reservoirs 30/32 may be integrated within the pump assembly 22A/pump head 22B (see FIG. 3), or may be external to either of those components. The important feature is the presence of each of these reservoirs 30/32 in close proximity to the present invention 20 permits the present invention 20 to perform advanced operations in a closed internal fluid loop with only a single piston and a single pumping stage.

It should be further understood that filling of the gas removal reservoir 30 from the fabrication reservoir FR can occur at the top of the gas removal reservoir 30 or at the bottom of the gas removal reservoir 30, etc. FIG. 1 depicts the gas removal reservoir 30 and filter 42 using orientation notation to show one alternative where fluid couplings to the top of those devices are being used.

A pump controller (e.g., a microprocessor, microcontroller, etc.; e.g., a Freescale MC9S12DG128CPVE microcontroller) 38 is coupled to the motor driven system 24, as well as each of the valves 1-12 to achieve the precise delivery of the process. By way of example only, the valves 1-8 and 10-12 may comprise diaphragmatic type valves (which are also referred to as diaphragmatic integrated valves, DIVs); valve 9 is a digital valve rather than a diaphragmatic valve. A bleed port valve BP1 is provided with the pumping fluid reservoir 32 and a bleed port valve BP2 is provided with the pumping chamber 34A; the importance of those valves will be discussed later. In addition, a pressure sensor PS is provided for detecting the pressure within the piston cylinder 28 as will also be discussed later. Operation of these diaphragmatic valves are discussed below under Diaphragmatic Integrated Valves. It should be further noted that control of the valves pertaining to the gas removal reservoir 30 and the pumping fluid reservoir 32 by the microcontroller 38 is not limited to an integrated controller within the pump system 20. It is within the broadest scope of the invention to include a remote controller of the valves associated with those two reservoirs.

Another key aspect of the present invention 20 is the ability to monitor, view and control the present invention 20 over a local area network (LAN), via wired (e.g., via an Ethernet connection, etc.) or wireless connection (e.g., Bluetooth, IEEE 802.11, etc.). This is accomplished via a network management module (NMM) 50, which includes, among other things, a web server microcontroller (e.g., Freescale MCF52235CAL60 microcontroller). As will be discussed in detail later, the NMM 50 permits the precision pump system 20 to be monitored remotely and in real-time, as well as, to permit remotely-controlling the system 20. The remote location includes a display controlled by a graphical user interface (GUI) that allows the operator to remotely monitor, view and control the operation of the precision pump system 20. This remote monitor, view and control subsystem is hereinafter referred to as the remote monitoring, viewing and controlling (RMVC) subsystem, which is discussed below under Remote Monitoring, Viewing and Controlling (RMVC) Subsystem.

FIG. 2 is an isometric view of the present invention 20 showing the precision pump system 22 and an electrical control box 23 which houses the electronics that control the pump 22, including the microcontroller 38 and the NMM 50 discussed previously.

FIG. 3 depicts the internals of the pump system 22. The filter distribution block 40 is mountable behind a front plate 25. Besides a coupling on the front plate 25, there is a maintenance button 25A that is activated to initiate the motor drive 24 removal; in particular, activation of the maintenance button 25A opens isolation valve 8. As can be seen, the motor drive 24 sits atop a main pump assembly 22A and the motor drive 24 can be released from the main pump assembly via the removal of four screws 24A-24D which can most easily be seen in FIG. 4. FIG. 3 depicts the pump body assembly 22A, pump head 22B, a pneumatic valve manifold 44, a cover plate 46 (see FIG. 4) to the pumping fluid reservoir 34A (FIG. 4B) and a pressure sensor board 48 (FIG. 11), which includes the pressure sensor PS (e.g., Honeywell ASDXRRX100PD2A5 digital pressure sensor) and a pressure sensor board microcontroller (e.g., Microchip PIC12F675-E/SN).

Pump Body 22A

The precision pump system 20 incorporates a unique design of a single stage pump with the use of two associated reservoirs, namely, the gas removal reservoir 30 (also referred to as the “pre reservoir”) and the pumping fluid reservoir 32, allowing the pumping fluid and the process fluid to be stored and accessed on an as needed basis. This allows the pump system 20 to perform operations in a closed internal fluid loop with only a single piston. A prior art closed loop system filled with and facilitating the movement of incompressible working fluid requires the increase and decrease using two or more pump stages to create an imbalance of pressure to induce flow. The decrease in the volume of one chamber must be equaled by the increase in volume of another connected chamber. The passively variable volume of the chambers (i.e., 28, 34A and 34B) in the present pump system 20 allows for a partially closed system, the volume of the total sealed space is constant but the shape of the fluid filled portions of the pump can change with the amount of fluid contained in the particular chamber.

As shown in FIG. 4, the pump body 22A comprises aluminum (by way of example only, machined to 6.15″×2.20″×2.20″). The front face 52A features a machined slot 54 for an anti-rotation guide 56 on the piston 26 to travel in. Around this slot 54 are four threaded holes for mounting the pressure sensor PS and associated printed circuit board 48, which also contains an infrared (IR) sensor that interfaces with the anti-rotation guide 56 on the piston 26. This front face 52A also features a tubing connection 58A/58B that taps into the piston chamber 28 inside the pump body 22A. The other end of this tubing 60 (FIG. 11) connects with the pressure sensor PS on the pressure sensor PCB 48. This pressure sensor PS is used for calibration and balancing of the pumping fluid levels in the pump body 22A.

On a left face 52B of the pump body is the pumping fluid reservoir 32 (see FIGS. 4 and 4A) that is machined to house extra pumping fluid that is used in the maintenance operations of the pump 20. There is an O-ring groove 115 machined around the perimeter of this chamber to allow an aluminum plate 46 to seal against this face 52A of the pump body 22A, thus completing the reservoir 32 for the pumping fluid. This sealing plate 46 is mounted to the pump with six screws 62 that secure into threaded holes around the perimeter of this face of the pump body 22A.

The back face 52C of the pump body 22A includes the pumping fluid chamber 34A (see FIGS. 4 and 4B) machined with an O-ring groove 63 (FIG. 4B), to seat an O-ring 65 (FIG. 4), around the perimeter to properly seal the diaphragm 36 (e.g., a PTFE diaphragm, see FIG. 4) against it with the use of a diaphragm hold down plate 64. This aluminum diaphragm hold-down plate 64 has a cut-out in the center that mimics the shape of the process fluid chamber 34B. This allows the diaphragm 36 to expand and contract through it while still having material over the O-rings to seal the diaphragm 36 to the pump body face 52C. This back face 52C of the pump body 22A features eight threaded holes for the counter-sunk screws 66 that secure the diaphragm hold-down plate 64 to it. It also features six larger diameter screw holes for mounting the pump head 22B (see FIG. 5) into position on the face 52C. There are through holes in both the hold-down plate 64 and the diaphragm 36 to accommodate the fourteen mounting screws required for the hold-down plate 64 and the pump head 22B. At the top right of this back face 52C, there is a threaded hole for a flow path that leads into the top of the pumping fluid reservoir 32. This pathway acts as the bleed port, i.e., BP1, used in the motor change procedure and in balancing the pumping fluid levels in the pump 20. Under normal operation (when the pumping fluid reservoir 32 is not in use), a screw BP1 (FIG. 4) is secured in this hole to seal the reservoir 32 from atmospheric pressure.

The right face 52D (FIG. 4) of the pump body 22A only has one feature. This is an angled cutout 53 (FIGS. 4 and 4B) that features a threaded hole that feeds into a flow path to the top of the pumping fluid chamber 34A. This acts as the bleed port BP2 for the pumping fluid chamber 34A. This threaded hole is sealed off by a screw 109. This screw 109 does not be need to be removed for any user-performed maintenance.

The top face 52E of the pump body 22A features four threaded holes for the stepper motor 24 to be mounted with four bolts 24A-24D. In the center of this face is a multi-diameter hole (FIG. 10). The first and largest diameter (e.g., 1.505″) is machined to a depth of, for example, 0.25″ and is only necessary for the seating of the stepper motor 24. The next diameter (e.g., 1.125″) is to provide clearance for the lead screw clamp and the anti-rotation guide 56 as they spin and travel within this hole, and is machined to a depth of 2.938″. The next diameter (0.75″) is the actual piston bore of the pump body 22A, machined to a depth of, e.g., 5.188″. This has an 8 RMS finish with electroless nickel boron plating to improve the hardness and prevent wear from the piston and acts as the sealing face for the piston 26. The bottom of this piston bore has a 60 degree chamfered edge to fit perfectly with the conical shape of the piston at its maximum stroke. The last diameter is 0.5″ and goes to a depth of approximately 5.875″. There are two flow paths that enter this final section. One leads to the front of the pump body 22A and is connected to the pressure sensor PS on the pressure sensor PCB 48. Off of this flow path another splits off to go to the isolation valve, valve 8, on the bottom of the pump body 22A that controls flow to the pumping fluid reservoir 32. The second flow path from the final section goes directly to the other isolation valve, valve 5, on the bottom face of the pump body 22A that controls flow to the pumping fluid chamber 34A.

The bottom face 52F of the pump 22A has two integrated valves (5 and 8) machined into it. These are designed similarly to the other diaphragmatic valves throughout the pump 22A. Valve 8 controls flow between the piston chamber 28 and the pumping fluid reservoir 32 and valve 5 controls flow between the piston chamber 28 and the pumping fluid chamber 34A. There is an aluminum valve plate 68 (FIG. 4) that holds a PTFE diaphragm 70 (FIG. 4) against the two O-rings 72 around the valve cutouts on the pump body 22A. This aluminum valve plate 68 is secured to the pump body with 4 screws 72 (FIG. 4). There are also four rubber mounting pads 74 (FIG. 4) secured around the valve plate 68 to keep the pump body 22A stable.

Isolation Valves V5 and V8

Isolation valves 5 and 8 are used in the pump system 20 to control the flow of the pumping fluid between the three pump fluid chambers 28, 32 and 34A. The valves allow the pump 22 to store and access additional pumping fluid on an as needed basis. Since only one isolation valve is open at any given time, this arrangement insures that only one flow path from the piston chamber 28 is active at that same time. Flow from the piston chamber 28 to the pumping fluid reservoir 32 does not affect the pumping chamber 34A and vice versa.

Reservoir for Incompressible Fluid Used in Motion Transfer

Fluid movement in a closed system filled entirely of incompressible fluid from one chamber to another requires the individual chamber volumes to be varied in conjunction with the fluid flow. It is impossible to adjust the normal holding volume of one chamber without directly and proportionally changing the normal holding volume of another. When this is desired, the only option is to incorporate an open system to allow the fluid volume to be altered. When a repeatable and reversible change in system volume is desired, the use of a reservoir allowing the fluid to be stored can be used to allow the fluid movement to and from the system while preventing any compressible fluids into the original system.

In order to allow the pump system 20 to perform maintenance functions with minimal physical disturbances to the pump 22 and pumped process fluid (e.g., photo chemical), a reservoir 32 for the incompressible fluid used in motion transfer, i.e., the pumping fluid, is incorporated into the pump body 22A. This reservoir 32 is capable of storing volumes of temporarily unused pumping fluid. During various maintenance functions, the reservoir 32 is used to both temporarily store pumping fluid from the piston chamber 28 and to create a fluid barrier to prevent air bubble entrapment in the pumping fluid channels inside the pump body 22A.

The pumping fluid reservoir 32 is connected to the piston chamber 28 through an integrated diaphragmatic valve, 8. This valve 8 remains closed during the normal pumping process to prevent fluid movement into and out of the reservoir 32 to maintain a constant volume of pumping fluid used in the piston chamber 28 and pumping fluid chamber 34A. During normal pumping processes the reservoir 32 simply stores pumping fluid that will be needed during the maintenance functions. The reservoir 32 is sealed from atmosphere by the pumping fluid reservoir bleed port screw BP1 and is filled to roughly half capacity during normal pumping operations. The fluid in the reservoir 32 is exposed to the air sealed inside the reservoir 32, but is unaffected by this gas due to the fluid's resistance to absorbing gas.

During maintenance processes, the reservoir bleed port screw BP1 is removed to allow the ingress and egress of air from the reservoir 32. This allows the pumping fluid levels to be altered while maintaining pressure equalization with atmospheric pressure. This ensures that no residual pressure differentials in the reservoir 32 will cause unwanted fluid flow to or from the rest of the pump 20. After the completion of the maintenance function the pumping fluid reservoir bleed port screw BP1 is re-installed to seal the reservoir 32.

During a head auto-balancing process, the pumping fluid normally in the piston chamber 28 is dispensed into the pumping fluid reservoir 32 and the valve 8 isolating the pumping fluid reservoir fluid from the piston chamber 28 is then closed. This frees room in the piston chamber 28 to allow the piston 26 to move pumping fluid from the pumping fluid chamber 34A as needed. Once the desired pumping fluid volume has been reached in the pumping fluid chamber 34A, the valve 8 isolating the reservoir 32 opens, allowing the flow of pumping fluid from the reservoir 32 to the piston chamber 28. As the piston 26 returns to the home position, the fluid flows from the reservoir 32 into the piston chamber 28, completely refilling it.

During the drive assembly change, the valve V8 isolating the reservoir 32 is opened allowing the pumping fluid normally held in the reservoir 32 to flow into the piston chamber 28. This flow is caused by the suction created by the O-ring seal as the piston 26 is removed. The fact the fluid path from the pumping fluid reservoir 32 to the piston chamber 28 is attached to the bottom of the reservoir 32 means that only the pumping fluid flows in the fluid paths inside the pump unless the reservoir 32 is completely empty. This prevents any gaseous bubbles from entering the internal fluid paths and other pumping fluid chambers.

Drive Assembly

The motor drive assembly 24 (FIG. 8) comprises a stepper motor 24E, a bearing 24F, a lead screw 24G clamped onto the motor shaft by a clamp 24H, and the piston 26 (FIG. 9). During assembly, the bearing 24F is pressed onto the stepper motor 24E (e.g., using 80-90 PSI). The stainless steel lead screw 24G is then installed onto the motor drive shaft and clamped into place. Grease is applied to the threads on the lead screw 24G and the piston 26 is screwed on. The stepper motor 24E is plugged into the pressure sensor PS PCB 48 that is mounted on the side of the pump body 22A.

The piston (FIGS. 8A-8B) features two O-rings 74 (FIG. 9) to keep the piston 26 properly aligned in the piston cylinder 28 of the pump body 22A and to better retain grease along with a proper seal. The bottom face 76 (FIG. 8) of the piston 26 is machined to be a conical shape. This shape aids in preventing air from being trapped in the piston cylinder 28 during initial assembly and during a drive change maintenance procedure. There is a piston wiper ring 77 (FIG. 9) installed above the two O-rings 74 to keep debris out of the grease and the piston chamber 28. An anti-rotation guide 56 is installed at the top of the piston 26 to serve as a restraint that keeps the piston 26 from turning as the motor 24E turns the lead screw 24G. The guide 56 travels in a machined slot 54 (FIGS. 4 and 4A) on the front face 52A of the pump body 22A. It is this anti-rotation guide 56 that converts the rotation motion of the piston 26 into reciprocating motion. This guide 56 also acts as a flag for the IR sensor mounted on the PCB 48 on the front face of the pump body 22A. When this flag is in between the prongs of the IR sensor, the pump software in the microcontroller 38 knows the piston 26 is at the home position (HRP).

Conical Piston Shape to Displace Fluid and Bleed Air Out of the Piston Chamber During Insertion

The pump system 20 relies of the absence of air in the pumping fluid chamber 34A to achieve highly repeatable and controllable dispenses. Air in the pumping fluid chamber 34A expands and contracts to an unacceptable degree due to the pressure changes that occur during the dispense cycle. To ensure no air remains in the piston bore 28 after the drive assembly changing process, the use of a piston 26 with conically shaped end 76 is incorporated into the pump 20. The addition of an inverted conical shape 76 to the piston 26 assures that any air is evacuated prior to the first O-ring sealing 74 with the piston bore.

When the piston 26 is to be reinserted into the piston bore 28 of the pump 22A, the pumping fluid level inside the piston bore 28 is just below a horizontal plane formed by the uppermost circumference of the piston bore 28. As the piston 26 is lowered into the piston bore 28, the conical shape 76 of the piston end displaces a volume of the pumping fluid in the piston bore 28. As the piston 26 lowers, the volume of displaced pumping fluid increases and causes the fluid level to rise in relation to the pump body 22A. The volume of the conical shape of the piston end is greater than the volume of the air initially located above the pumping fluid and below the plane formed by the upper section of the piston bore 28. Since the volume of displaced liquid is larger than the volume of air, the fluid rises to the point it fills the entire volume located below the O-ring sealing surface of the piston bore 28.

The volume of the conical shape is sufficient to displace the air below the sealing surface, while not causing an undue amount of spillage from any excess pumping fluid being forced out of the piston bore 28. The conical shape 76 is important to the evacuation of air since the angled face directs any bubbles already floating in the piston chamber 28 up and out of the piston bore 28. The outward angle face of the conical piston works in conjunction with the buoyant nature of gas bubbles to evacuate all gasses from the volume sealed by the O-rings 74 against the piston bore 28.

Pump Head 22B

The pump head is depicted in detail in FIGS. 6-6C. The pump head (FIG. 6) consists of a PTFE block 78 and an aluminum valve plate 80. The PTFE block 78 contains the process fluid chamber 34B on one face along with four diaphragmatic integrated valves (1, 2, 3, and 7) and the gas removal reservoir 30 (also referred to as the “Gas removal reservoir”) on the opposite face. There are four flow paths in and out of the gas removal reservoir 30, as shown in FIGS. 1 and 1A. These flow paths connect to the process fluid source 10 (e.g., fabrication reservoir), the filter valve block 40, and the process fluid chamber 34B on the opposite face of the head PTFE block 78. The process fluid chamber 34B is cut into the face of the PTFE block 78 that interfaces with the pump body 22A. This chamber 34A is in the shape of an elongated rectangle with circular ends. There is a raised edge around this chamber to support an O-ring. The diaphragmatic valve cutouts on the opposite face of the PTFE block 78 are designed as those described in the Diaphragmatic Integrated Valves section below. As shown most clearly in FIG. 6B, the gas removal reservoir 30 is cut into the same face as the valves 1, 2, 3 and 7. It is shaped as a square but with one vertical edge longer than the other to create a high point in the chamber 30 that aids in bubble collection and venting. The process fluid source inlet is positioned on the roof of the gas removal reservoir where the side wall meets the roof on the shorter vertical side. The purpose of the source inlet's position is to allow for the process fluid to enter into the gas removal reservoir at an angle near the side edge which allows for the process fluid to smoothly run down the wall of the gas removal reservoir instead of dripping from the top of the reservoir, which can cause the capturing of air as the fluid falls. There is a raised edge around the reservoir 30 that is similar in profile to those that surround the integrated valves 1, 2, 3 and 7. Four flow paths exit the PTFE block 78 through ¼″ male flare fittings on the top face. Two of these lines are connected to the filter valve block 40 and the other two go to the process fluid chamber 34B and the process fluid source 10. Four set screws 82 hold the male flare fittings securely in place in the block 78. FIG. 11 depicts how the pump head 22B and the pump body 22A are mated together.

The aluminum valve plate 80 (FIG. 6) features four valve cutouts, mirrored to the valve cutouts on the corresponding surface 80A (FIG. 6B) of the PTFE block 78, and an O-ring cutout 30A that lines up with the raised edge around the reservoir 30 on the PTFE block 78. The valve cutouts on the aluminum plate 78 are designed similarly to those described in the diaphragmatic integrated valves section below. The aluminum valve plate 80 holds the O-rings for valves 1, 2, 3 and 7 as well as for the gas removal reservoir 30. In between the aluminum valve plate 80 and the PTFE block 78, there is a PTFE diaphragm 84 (FIG. 6) similar to that described in the diaphragmatic integrated valves section below. The pieces are assembled and secured to the pump head using six screws 86 (FIG. 6) that travel through the whole assembly and fasten to the pump body 22A.

Diaphragmatic Integrated Valves

The present invention 20 is designed to take up minimal space to allow the customer to optimize the space available in the coater/developer where the pump 20 is installed. The valves used throughout the pump system play a major role in reducing its footprint. Off-the-shelf valves tend to take up too much space. The valves in the pump system of the present invention 20 are low profile diaphragm valves that are designed right into the pump head 22B. The following discussion pertains to the diaphragmatic valves uses in the pump head 22B, it being understood that diaphragmatic valves used elsewhere in the present invention have a similar construction.

The valves and associated flow paths are machined into the virgin PTFE block 78, allowing the pump 20 to perform a variety of complex operations in a very small amount of space.

The basic diaphragmatic integrated valve design consists of three parts: a PTFE block, a PTFE diaphragm, and an aluminum plate. The PTFE block contains the flow paths and the circular valve chambers for the process fluid to flow through. The aluminum plate serves as a manifold to distribute the air required for the pneumatic actuation of the valves, having flow paths and circular chambers that minor the valve chambers on the PTFE block. The PTFE diaphragm is the interface between the PTFE block and the aluminum plate and is forced into either the PTFE block's chambers or the aluminum plate's chambers by positive or negative pressure from the pneumatic lines, respectively.

The valve design on the PTFE block side involves a shallow circular cutout on the face of the block, and has both an inlet and outlet flow path that connect with this circular chamber. On the block face surrounding the circular cutout, there is a raised lip to provide a better sealing surface with the diaphragm against the aluminum plate. One of the two flow paths that intersect with the valve cutout is usually located near the center of the circle to allow the diaphragm to effectively seal the path when it is pushed into the valve cutout by pneumatic pressure from the other side.

The diaphragm is made of 0.01″ thick PTFE sheets and is cut to the size of the sealing face of the valve block. Any holes needed for mounting valve blocks are cut in the diaphragm sheet to allow bolts and screws to pass through. The thickness of the PTFE diaphragm allows it to be deformed by the pneumatic pressure and vacuum to fill the cutout chambers in the PTFE block and aluminum plate, respectively.

The aluminum plate is designed with circular cutouts on the face that mates with the valve face of the PTFE block. These cutouts are placed to minor the cutouts on the PTFE block, creating a valve chamber that is bisected by the diaphragm when the parts are assembled. O-ring grooves are machined around the valve cutouts on the aluminum plate for the raised lips around each valve cutout on the PTFE block to seal against. Each valve cutout on the aluminum block interfaces with one flow path in which pressurized air travels through. The flow paths containing the pressurized air travel through the aluminum plate and are finished with a fitting that allows the connection of nylon tubing. This tubing is connected to a separate valve manifold with a bank of 3-way valves that control the application of either pressure or vacuum to each of the valves in the pump system individually.

To understand operation of the diaphragmatic valve, FIGS. 6-6A depict the construction of DIV valves 1, 2, 3 and 7, it being understood that all of the DIV valves operate in a similar manner. As can be seen in FIG. 6, the control side of the DIV (e.g., valve 7) is on plate 80 which comprises a control port CP (e.g., an air port) surrounded by a channel CH into which an O-ring 81 is disposed. A diaphragm 84 is disposed in between plate 80 and surface 80A of the block 78. As can be seen in FIG. 6B, surface 80A of the block 78 comprises the “output” portion of the DIV 7 which comprises two outlet ports 83A/83B. Operation of the diaphragmatic valve involves connecting the control port to a pneumatic source where either a pressure or vacuum is applied. When pressure is applied, the diaphragm closes the two outlet ports and conversely when vacuum is applied the diaphragm opens the two outlet ports.

Gas Removal Reservoir's 30 Seal:

As shown most clearly in FIG. 6, the gas removal reservoir 30 is sealed by a PTFE diaphragm cover and a metal plate with an integrated O-ring groove on it. The gas removal reservoir 30 has a raised ridge providing support to the PTFE diaphragm cover around the edge for better sealing. The back metal plate provides uniform support to the gas removal reservoir PTFE diaphragm cover and ensures no leakage around the O-ring sealing. Table 1 is a definition of the various DIVs:

TABLE 1 DIV Valve Numbers and Description Diaphragmatic Integrated Valve Number Diaphragmatic Integrated Valve Description 1 Inlet-Gas removal reservoir 30 2 Outlet-Gas removal reservoir 30/Inlet-Pump 3 Outlet-Pump/Inlet-Filter 4 Recirculation Valve 5 Pumping Fluid Chamber 34A-Isolation Valve 6 Filter Vent/Drain 7 Gas removal reservoir 30-Drain 8 Pumping Fluid Reservoir 32-Isolation Valve 9 External Digital valve (customer supplied) 10 Filter recirculation (see FIG. 15) 11 Internal Recirculation Shut-off (see FIG. 15) 12 Gas removal reservoir 30 N₂ Supply (see FIG. 15) V_(FAB) Value connecting fab reservoir FB to fab drain. External Valve Block/Filter Block 40

The pump system 20 utilizes valves and valve controls to direct fluid flow during the various maintenance, startup, and operating processes. This must be achieved while maintaining the compact size of the pump required by the spaces in which they are mounted. To meet the aforementioned requirements, some of the diaphragmatic valves are included in a small external block (FIG. 7). This block directs fluid flow to and from six connections 175 (FIG. 7). The valve block includes connections from filter vent connection, from the filter fluid output line, to the external dispense digital valve, to the pump system drain line, from the gas removal reservoir vent line, and to the gas removal reservoir recirculation line. The fluid flow is controlled by four pneumatically-actuated integrated diaphragmatic valves 177 (FIG. 7). One valve (DIV 6) controls the fluid flow from the filter vent connection to the system drain/vent line. One valve (DIV 10) controls the fluid flow from the gas removal reservoir recirculation line to the system drain/vent. One valve (DIV 4) controls the fluid flow from the filter output to the gas removal reservoir. One valve (DIV 11) controls the fluid flow from filter output line to the point of the external dispense digital valve. Those valves direct fluid flow during each operation with filter involved. FIG. 7A shows the assembled filter block.

Pneumatic Valves and Manifold 44

A bank of three-way pneumatic valves 44 (FIGS. 3 and 11) is used to control the application of pressure or vacuum to the integrated valves used throughout the pump 20. The preferred embodiment uses 8 SMC V100 valves mounted on an SMC 8-position manifold. This manifold has 2 main flow paths that run the length of it. One path is for pressure and the other is for vacuum. These flow paths are capped at one end by 2 M5 cap screws, and have 2⅛″ tubing barb fittings screwed into the other end. The SMC valves are mounted on the front face of the manifold, which has the proper ports necessary to interface with these valves. On the top of the manifold are 8 SMC ⅛″ tubing fittings that run to each of the eight integrated valves used throughout the pump system 20. Each SMC valve on the manifold has access to the common pressure and vacuum rails, but accesses only one of the eight ports out to the integrated valves. The pressure and vacuum lines to the manifold are connected from the panel connectors located on the pump enclosure 22. The user need only need to connect fab pressure and vacuum source lines to the connectors on pump enclosure 22. FIG. 11A depicts the connections of the various flare fittings.

Quick Disconnect Electronics:

The electronics are made to be easily replaced simply by loosening the enclosure attachments & unplugging the connectors on the pump controller pigtails. (FIG. 12).

Electronics Enclosure 23

The electronics enclosure 23 (FIG. 2) is designed to house the main controller PCB 530 (FIG. 13C), network management PCB 50 (FIG. 13C), RDS translator PCB 539 (FIG. 13C), and optional digital valve controller PCB 538 (FIG. 13C). These boards are encapsulated by a two-piece sheet metal casing. The enclosure is designed to be mounted next to the pump enclosure and is easily removable from the mounting plate in the track without disturbing the pumping hardware. The enclosure allows for the connection of network cables, power cables, track communication cables, and an N₂ line. Cable connectors are external to the enclosure to allow easy removal of the electronics enclosure from the track. The enclosure is accented by stickers that display connection labels, model numbers, and brand logos.

Pump Enclosure

As shown most clearly in FIG. 3, the pump enclosure 22 comprises five stainless steel sheet metal pieces: a base plate 165, a bottom enclosure 167, a cover 173, an access panel 169, and a filter manifold bracket 248. The purpose of the pump enclosure 22 is to house and protect the pump parts. The enclosure 22 features fluid connections for the source input, dispense output, and drain lines. The enclosure 22 also allows for the connection of the pump power and control wires as well as connections for N₂, pressure, and vacuum lines. The pump enclosure is secured to a track mounting plate 243, next to the electronics enclosure 23. The filter manifold bracket 248 features mounting holes in a variety of different configurations to allow the user to mount multiple types of filter brackets (see Filter Manifold Bracket section below). There is a push button switch 25A installed on the front of the enclosure to ensure the user is present when performing certain maintenance functions on the pump. The pump enclosure includes indicia (e.g., stickers) to identify the model number and to label the incoming and outgoing connections.

Track Mounting Plate 243

The stainless steel sheet metal track mounting plate 243 (FIG. 3) allows the electronics enclosure 23 and the pump enclosure 22 to be installed side-by-side in the track. The track mounting plate 243 comprises a mounting-hole pattern for other pumps (e.g., Entegris RDS pump). The pattern of the mounting holes on the plate is symmetric so that the plate 243 can be installed upside down without changing the mounting orientation of the pump enclosure 22 and electronics enclosure 23. The plate 243 allows the electronics enclosure 23 to be removed from the track without removing the pump 22 or vice versa. The symmetry of the enclosure mounting holes also allows the electronics enclosure 23 to be installed to either the right or the left of the pump enclosure, depending on the user's preference. There are PEM keyhole fasteners on one side of the track mounting plate 243 for securing screws that mount the enclosures to it.

Filter Manifold Bracket 248

The stainless steel sheet metal filter manifold bracket 248 (FIG. 3) has predrilled mounting holes for attaching three different OEM filter manifolds. These preconfigured hole patterns allow for the attachment of either other components, such as, but not limited to, Entegris Impact 2, Entegris ST, or Pall EZD-3 filter manifold.

Bleed Port Syringe

During a drive system change, the user is prompted to remove the pumping fluid reservoir bleed screw BP1 and attach a provided syringe (FIG. 13). This syringe is used to push air into the pumping fluid reservoir 32 while valve 8 is open, thus pushing pumping fluid into the piston chamber 28. The extra pumping fluid fills the piston chamber 28 to allow the insertion of a new motor drive assembly 24. The provided syringe apparatus comprises, by way of example only, a 15 cc luer lock tip syringe, a luer lock to 1/16″ tubing coupling, and a tubing with 6″ in length and 1/16″ in ID. These pieces come assembled with the replacement pumping chamber diaphragm parts. As shown in FIG. 13, the syringe 222 comprises a 20 cc (by way of example only) Luer Lock tip, a tube coupling 263, Luer Lock to 1/16 inch tube (by way of example only) and a tube 264 that is 1/16 inch by 4 inches long (again, only by way of example).

Remote Monitoring, Viewing and Controlling (RMVC) Subsystem

As discussed previously, the pump system 20 is software controlled in all aspects of the pump operation, including the dispense parameter monitoring, maintenance prediction and control, as well as the setup and control of normal pumping operations. The pump controller 38 (FIG. 1) performs these functions through various interfaces not shown. The network management module 50 (FIG. 1) allows Ethernet or wireless network control of the pump through the microcontroller 38. In a simpler embodiment the pump controller 38 is directly connected to a specifically programmed graphical user interface (GUI) via a serial interface. The RMVC subsystem is also referred to by its tradename “Lynx”.

FIG. 13A shows an embodiment of the pump of the present invention 20 having a graphical user interface (GUI) connected over a network, e.g., Ethernet, local area network (LAN), wide area network (WAN), a virtual private network (VPN), the “cloud,” the Internet or an Intranet. This is achieved via a web server WS that is connected to the pump controller 38 via the network management module NMM 50 to form a “web-served GUI.” In particular, the web-served GUI incorporates an Ethernet communication via an RJ45 connection. The web server WS is a small surface mount component on the NMM 50 housed in the pump 20 and is used for pump configuration, operation and monitoring using a standard web browser. All pump configuration parameters are entered and read using this interface. The web server WS communicates with the pump 20 on serial port0. The web server WS may comprise megabytes of flash memory suitable for web page storage. Hence, the web-served GUI is also referred to as the “remote monitoring, viewing and controlling (RMVC) subsystem.

As shown in FIG. 13B, the web server WS may be enhanced with an additional Ethernet port for use with an optional networked device. Power-Over-Ethernet (POE) may be used to supply power to an optional networked device, e.g., a web cam. This Ethernet port is not used by the web server WS. The optional web cam may be used to observe the pump 20 operation remotely. It should be noted that the web cam is controlled by software supplied therewith. FIG. 13C depicts an exemplary web cam, such as the Wireless IP Network Camera Pan Tilt WIFI Webcam CCTV IR Night USA Plug 80413 by Yaloocharm.

FIG. 13D depicts a block diagram of the web server interface that is enhanced with an additional, built-in, Wireless Ethernet port for use when the network cable would be inconvenient.

FIG. 13E shows a block diagram of the NMM 50. As mentioned previously, the NMM 50 includes the web server WS having a web server microcontroller 501 with embedded Ethernet engine, a CanBus driver (Controller Area Network bus) 502, a 2 port Ethernet switch 503, flash memory 504 and a Power over Ethernet (POE) power supply and controller 505. An exemplary device for the web server microcontroller is the Freescale MCF52235CAL60 microcontroller.

Motherboard Interfaces

As shown in FIG. 13F, the motherboard 530 of the pump controller 38 includes a central microcontroller, which is responsible for all of the system control functions. The microcontroller is connected to the pump stepper motor through the stepper motor drive 532. The microcontroller is connected to the valve drivers 533 and pressure sensor/PCB electronics 48 via a serial connection. In the embodiment depicted, the pressure sensor electronics include a separate microcontroller which monitors pressure and sends this data to the central pump controller 38. As stated above, the central microcontroller is also connected to the NMM 50, which allows GUI control of the pump process through the Internet either via Ethernet or WiFi wireless connection. The pump controller 38 is also optionally connected to a digital valve controller 536 for control of up to three valves. The pump controller 38 is also optionally connected to the RDS translator module 539, an external RS232/485 converter 537 and a track I/O daughter card 538.

GUI Options

A first GUI option is a standard singe platform installed GUI, block diagrams of which are shown in FIGS. 13G-13I. The standard GUI may be modified for use with the tiny web server WS. This GUI is still a single platform and the GUI requires installation on the client machine.

A second more preferred GUI is the cross platform JAVA virtual machine GUI, block diagrams of which are shown in FIGS. 13J-13L. In particular, as compared to the first GUI option, the second GUI option is a more flexible GUI when written as a JAVA applet. This applet may be served from the tiny web server WS and utilizes the JVM (JAVA virtual machine) runtime libraries. These runtime libraries are part of the JVM. JVM supported platforms, as shown in FIG. 13L, that can serve as potential GUIs are: Windows® (x86-64, IA-64 processors), Solaris® (x86-64, SPARC processors), Linux® (x86, x86-64, IA-64, PowerPC, System z (formerly Z-Series) processors), HP-UX (PA-RISC, IA-64 processors); i5/OS and AIX (both PowerPC® processors).

An exemplary operational description is as follows:

-   -   1) Open a web browser and input the pump's Internet Protocol         (IP) address;     -   2) The GUI, written as a JAVA applet is served to the web         browser from the tiny web server WS;     -   3) The JAVA applet is executed in the web browser's JVM;     -   4) The GUI, as written, appears in the web browser;     -   5) Data fields may be read and/or changed and these updates are         sent to the tiny web server WS over Ethernet via UDP; the tiny         web server WS converts the UDP (user datagram protocol) commands         to the Assignee's ASCII serial protocol equivalent and updates         the pump. Using UDP allows an unlimited number of “listeners on         the data connection.” This is useful for multiple people         observing and for automatic data logging devices such as the         Assignee's “Failsafe” product.

As to the GUI's internal firmware, this may be updated in four ways:

-   -   1) via a flash update plug: this method requires physical access         to the pump electronics in addition to a laptop with a BDM         (background debug mode) flasher;     -   2) via a full web update: this process may be used when there is         a network connectivity to the Assignee's update servers. This         option does not require physical access to the pump electronics;         and     -   3) via a request update: the user in the RMVC interface simply         clicks on the “Program update” option the program firmware is         downloaded and programmed from the Assignee servers; and     -   4) Via an automatic setting: If the user had previously selected         “Automatic Program Updates”, then the RMVC system downloads and         programs the firmware whenever an update is available.

It should be noted that an internal network update is also available. In particular, this option may be used when there is no network connectivity to the Assignee update servers. This option does not require physical access to the pump electronics. This option is similar to “Full Web update” described above except an update folder is specified on the internal network instead of the Assignee's update server.

The RMVC subsystem adds additional value by being able to provide a direct camera and audio connection between a technician working with our pump and our field service workers. As mentioned previously, an exemplary camera and audio device is the Wireless IP Network Camera Pan Tilt WIFI Webcam CCTV IR Night USA Plug 80413 by Yaloocharm (as shown in FIG. 13C).

a. Video Camera for use in yellow light (semi FAB) environment

b. Yellow camera light for use with a video camera in a yellow light (semi FAB) environment.

c. Wide range pan, tilt, zoom, lights, focus, audio, for unattended remote control operation.

To operate this feature, the FAB tech clicks “Request Service” Button in NMM GUI. This sends a Service request to the IDI remote service center. IDI Field service personnel acknowledge the request & initiate a remote connection with “service” credentials. At this time the IDI remote service center personnel have full, remote control, of all of the video camera, & pump controls. Audio may be enabled to discuss the issue with the FAB tech. FAB safe video camera lights may be activated & the camera's pan, tilt, and zoom can be manipulated to observe any pump malfunction. The IDI service personnel may operate the pump while observing its operation. With the proper credentials, anyone can join the audio/video feed & manipulate the pump or just observe & listen while the diagnosis & repairs are being made.

It should be understood that the RMVC subsystem can be used an unlimited number of pump devices and that its integration with the pump system of the present invention 20 is by way of example only. The RMVC subsystem can be used, by way of example only, for any process equipment used in a wafer fabrication facility, or in medical facilities, or in oil and gas facilities, or in food processing facilities and even in cosmetic facilities.

Chambers as Compared to Reservoirs

As mentioned previously, the two reservoirs associated with the pump system 20 are the gas removal reservoir 30 and the pumping fluid reservoir 32 (FIG. 1). These are referred to as reservoirs since they have a set volume capacity. The three chambers on the pump system 20 are the process fluid chamber 34B, the pumping fluid chamber 34A, and the piston chamber 28 (FIG. 1). These are referred to as chambers because their volume can change. The pumping fluid chamber and process fluid chamber volumes can change as the diaphragm 36 moves around inside the pumping chamber 34. The pumping chamber 34 is the chamber where the pumping chamber diaphragm 36 is mounted. The overall combined volume of the two chambers, the pumping fluid chamber 34A and the process fluid chamber 34B, remains constant, but because of the flexible PTFE diaphragm component 36, the individual chamber volumes may change. The piston chamber 28 has a dynamic volume since the piston moves around and affects a change of volume.

Pump Chambers: Piston Chamber, Pumping Fluid Chamber, and Pumping Fluid Reservoir

The pumping fluid in the single head pump system 20 is primarily contained in two chambers (i.e., piston chamber 28 and pumping chamber 34A) and one reservoir 32 associated with the pump body 22. The first of the three pumping fluid chambers houses the piston 26 and the piston bore 28. In the pump system, mechanical energy is converted from the stepper motor 24E that assists the piston 26 in creating a reciprocating motion in piston chamber 28. The second chamber is the primary pumping fluid chamber 34A that is responsible for transferring the work done by the piston 26 through the pumping fluid to the diaphragm 36, which expands or contracts with the motion of the piston 26. The pumping fluid reservoir 32 stores the pumping fluid that is unused during normal dispense actions, as well as assists in the prevention of air bubbles from entering into the other pumping fluid chambers. The remainder of the pumping fluid resides in the fluid paths connecting the two chambers/one reservoir as well as the valves located along these fluid paths. The integrated pneumatically operated diaphragmatic valves 5 and 8 control the fluid flow from the piston chamber to the other two chambers (see isolation valves 5 and 8).

How the Process Fluid Chamber Changes Volume to Pump Fluid:

The present invention pump system 20 uses the incompressible pumping fluid as a medium to transmit the motion of the piston 26 to a rigid chamber 34 (FIGS. 1 and 1A) split with an internal Polytetrafluoroethylene (PTFE) diaphragm 36. The rigid nature of this chamber coupled with the flexibility of the diaphragm 36 causes the portion of the chamber in the pump head (see pump head section) to increase and decrease in process fluid volume proportionally with the pumping fluid volume. The pump head portion of the chamber 34B is filled with process fluid that the user intends to dispense. Since the process fluid is incompressible, fluid flow is affected as the available chamber volume changes.

Pump Head 22B

How the pump 22 actually pumps the fluid:

The pump 22 can dispense a variety of chemical fluids. The fluid being dispensed, as mentioned previously, is referred to as the process fluid and the flow of this process fluid is controlled by the pneumatically operated diaphragmatic integrated valves (1, 2, 3 and 7). These DIVs are located on both process fluid paths connected to the process fluid chamber 34B. Process fluid dispenses are caused by closing DIV 1 and DIV 2 and opening DIV 3 in the line while the pumping fluid flows into the pumping fluid chamber 34A. The pump 22 finishes its dispense procedure by “recharging” the gas removal reservoir 30 from which it made the dispense by closing DIV 3 and opening DIV 1 and DIV 2 while the pumping fluid flows out of the pumping fluid chamber 34A. This process is repeated to cause a controlled fluid flow. The head portion 34B of the process fluid chamber has a total of two fluid paths connecting it with an external valve block 40 and the associated gas removal reservoir 30. All fluid paths from the head portion of the process fluid chamber are controlled through the DIV valves.

Gas Removal Reservoir 30:

As mentioned previously, the pump system 20 includes the gas removal reservoir 30. This reservoir 30 is used to prevent air from entering the process fluid chamber 34B of the pump head 22B. The addition of air in the process fluid chamber 34B would induce a delay in fluid flow. Since air is a compressible gas, the air expands and compresses absorbing some of the volumetric changes in the pump head process fluid chamber 34B and prevents the fluid flow from equaling the volumetric change. The fluid path between the associated gas removal reservoir 30 and the process fluid chamber 34B connects the bottom sections of both chambers.

How the Head 22B Keeps Air out of the Process Fluid Chamber:

The process fluid pools at the bottom of the gas removal reservoir 30 (also referred to as the “pre reservoir”) while any air will float to the upper section of the reservoir 30, preventing the inclusion of air in the process fluid chamber. The upper section of the gas removal reservoir 30 is shaped so as to concentrate the rising bubbles to a single point (see FIGS. 1A and 6-6B). The removal of the air bubbles is aided by a process that expels, or purges, a small amount of liquid into the fluid path connected with the uppermost portion of the gas removal reservoir. This fluid path leads to a drain line and is closed during all normal operations of the pump system.

External “Out” Paths:

The gas removal reservoir 30 has a total of four fluid paths (FIG. 1) connecting it with the process fluid chamber 34B, the drain line, the fluid source FR connection of the pump system 20, and an external valve block 40. The connections to the process fluid chamber drain line and fluid source are routed through the pneumatically operated diaphragmatic valves to control flow. Fluid flow through the fluid inlet from the external valve block is controlled by a valve located in the external block. This means that a separate valve inside to the pump head is not needed.

Gas Removal Reservoir's 30 Shape:

The reservoir's cross sectional area is shaped as a quadrilateral (see FIGS. 6-6B) with the bottom face oriented along a horizontal plane, the two parallel sides oriented along a vertical plane and an angled upper face. The intersections of all the faces of the reservoir incorporate a radius to prevent atmospheric bubbles from collecting in the corners. The intersection points of the three fluid paths on the upper face are intended to aid the evacuation of atmospheric bubbles. In order from closest to furthest from the horizontal bottom face are the fluid source connection, the fluid inlet from the external block, and finally the drain line connection. The source inlet is the lowest to ensure bubbles cannot travel into this connection while the fluid in this path is not moving. The fluid inlet from the external valve block is the next lowest connection. During the startup procedure the fluid traveling through this path will fill the line and carry any atmospheric bubbles out of the path. The highest connection is the drain line. The angled face of the reservoir ensures any air displaced during the startup and purging procedure will collect directly beneath the drain connection.

Valve Sequencing for Operation-Microcontroller 38 Operation

Dispense:

The dispense (FIG. 18) starts from the pre-charge position and begins when the pump 22 receives a trigger signal. The DIVs 3, 5, 11 and the external dispense valve 9 (e.g., the IDI Digital Valve) are opened and the motor 24E moves the piston 26 down to the user specified volume. This position is designated as End of Dispense (EOD). When EOD is reached, the valves are closed and the pump 22 begins the automatic procedure to fill itself by completing the “Recharge” operation.

Recharge:

The recharge (FIG. 18) starts by opening the valve 1 separating process fluid from the source inlet and gas removal reservoir inlet, the valve 2 separating process fluid the chamber and the gas removal reservoir, and the valve 5 separating pumping fluid from the piston chamber 26 and the pumping fluid chamber 34A. Driven by the motor 24E, the piston 26 moves back to the home reference position (HRP) which creates a negative pressure in the process fluid chamber 34B and “recharges” or fills process fluid from the gas removal reservoir 30. At the same time, the gas removal reservoir 30 is fed process fluid through valve 1 that is supplied by the fabrication reservoir FR. All other valves remain closed when the recharge takes place. When the recharge operation is complete all valves are closed.

Precharge:

The pre-charge (FIG. 19) begins after any operation that lets the pump 22 return to a “ready”, PS0 status such as after a Recharge or after exiting “Maintenance Mode”. The pre-charge opens valves 2 and 7 and moves the piston forward 26 (down) to push a predetermined amount (e.g., 3 mL) of pumping fluid through the vent line. This action allows the high pressure developed due to valve closures to be pushed out through the source line to lower the pressure and then closes valves 2 and 7. The piston 26 moves forward to begin building up pressure to a user defined pressure (e.g., +1.0 psi). This is done by moving the stepper motor 24E in proportion to the pressure error from actual pressure to desired pressure. Once the user-defined pressure is reached, the pump 22 returns a ready status and is in a loop checking for pressure fluctuations. If the pump 22 raises or lowers to +/−15% of the desired pressure, the pump 22 corrects the pressure by moving the piston 26 forwards or backwards to achieve the specified pressure. This action allows the pump to always start the dispense from the same pressure point providing extremely consistent dispense performance.

Purge to Vent (Prime Gas Removal Reservoir 30):

Purge to Vent (FIG. 20) is an operation that pulls fluid from the source reservoir into the pump 22 and purges the air out of the gas removal reservoir 30 and the source line tube. This operation must be completed while the pump is in “Maintenance Mode”, and is accomplished by activating the “Purge to Vent” command from the “Maintenance” window, in the Purge tab of the GUI (of the remote monitoring/control subsystem) or by clicking on the “purge to vent” button in the “Purge” operation drop down list under the “Maintenance” tab of the RMVC subsystem. This command is a manual input that can be specified to run infinitely or to run a specified number of cycles. A cycle includes one purge to the vent line and one recharge. The pump 22 begins this procedure by checking if the piston is at HRP. If the piston 26 is at HRP, then it begins the purge to vent process. If the piston 26 is not at HRP, then the pump 22 recharges until the piston 26 reaches the HRP. This recharge is identical to the standard Recharge procedure discussed previously. Once the piston 26 is at the HRP, the pump 22, with valve 5 open, opens valves 2 and 7 and moves the piston 26 down to the 11 mL mark. The pump 22 then closes valves 2 and 7 and performs a Recharge by opening valves 1 and 2 and moving the piston 26 back to HRP. The pump 22 repeats this process until the designated number of cycles has been completed or until the user stops the operation. Once this operation is done, when complete the pump is ready for the user to exit “Maintenance Mode” which begins the Pre-charge operation.

Priming the gas removal reservoir 30 first from the source gives the pump 22 enough fluid to start recirculation using only the liquid in the gas removal reservoir 30. This allows the pump 20 to run multiple cycles of the recirculation to gather as many bubbles in the reservoir as possible without wasting any fluid of out the vent line.

Purge to Output (Prime Process Fluid Chamber 34B):

Purge to Output (FIG. 21) is an operation that pulls fluid from the source reservoir into the pump 22 and purges the air out of the source line tube and the process fluid chamber 34B. This operation must be completed while the pump 22 is in “Maintenance Mode” and is achieved by activating the “Purge to Output” command from the “Maintenance” window, in the Purge tab of the GUI of the RMVC subsystem or by clicking on the “purge to output” button in the “Purge” operation drop down list under the “Maintenance” tab in the RMVC subsystem. This command is a manual input that can be specified to run infinitely or to run a specified number of cycles. A cycle includes one purge to the output or dispenses line and one recharge. The pump 22 begins this procedure by checking if the piston 26 is at HRP. If the piston is at HRP, then it begins the purge to output process. If the piston 26 is not at HRP, then the pump 20 recharges until the piston 26 reaches the home position. This recharge is identical to the standard Recharge procedure from above. Once the piston 26 is at HRP, the pump 26, with valve 5 open, opens valve 3 and moves the piston 26 down to the 11 mL mark. The pump then closes valve 3 and performs a Recharge by opening valves 1 and 2 and moving the piston 26 back to HRP. The pump 22 repeats this process until the designated number of cycles has been completed or until the user stops the operation. When complete, the pump 22 is ready for the user to exit “Maintenance Mode” which begins the Pre-charge operation.

Initial Priming without BIB Pump Initially Primed

PPRM2 (Prime Filter Housing; FIG. 22):

The present invention pump system 20 incorporates a filter attachment which helps to reduce trapped air bubbles in the process fluid line. The filter housing is primed by the following procedures. Step 1: A maximum dispense volume proceeds with piston 26 moving from home position to the furthest position in piston chamber 28; the valve 3 controlling process fluid flow from pumping fluid chamber 34A to filter inlet, the valve 6 controlling the process fluid flow from the filter vent to the external drain line, and the valve 5 separating pumping fluid between the piston chamber 28 and process fluid chamber 34B are open; all other valves including the external digital valve 9 at the dispense line remain closed. This allows process fluid only to pass through the filter housing and exit from the filter vent line. Step 2: The following recharge from the source line takes place with valves 1, 2, and 5 open and valves 3, 4, 6, 7 and 8 remain closed. The external digital valve 9 can be at any state, open or closed. The recharge is at maximum recharge volume with a full stroke motion of the piston chamber 28. The action of step 1 and 2 are repeated until process fluid comes out of the filter vent line without air bubbles.

PPRM3 (Prime Filter Substrate; FIGS. 23A-23B):

The filter substrate 42 has to be wetted for proper operation of the filter and to remove all of the air from the filter can be primed via the following “prime filter substrate” function. The filter substrate 42 can be primed by the following steps. Step 1: Valves 3, 4, 5, and 7 are open; valves 1, 2, 6, and the external digital valve 9 remain closed. That allows process fluid to enter into the filter 42 from the process fluid chamber 34B and to emerge from the filter 42 via the filter output port and into the pump filter recirculation line. The process fluid in the recirculation line then enters into the gas removal reservoir 30 and continues through the gas removal reservoir vent/drain line. During this priming process, the maximum dispense volume is used, 11 mL, as the piston moves from the HRP to the 11 mL end of dispense (EOD). The pump then “recharges from source” by opening DIV 1, 2, 5 and closing DIV 3, 4, 6, 7, 8, and 9 and retracting the piston from EOD to HRP. Step 1 is repeated one more time, for a total of two times. The next operation of the PPRM3 functions executes is step 2. Step 2 starts by opening DIV 3, 4, 5, and 7 (FIG. 11A) and closing DIV 1, 2, 6, 8 and valve 9 and pushes 11 mL of process fluid into the filter 42 from the process fluid chamber 34B. The process fluid then exits the filter out of the filter output port and continues into the recirculation line, which leads back to the gas removal reservoir 30 while air is pushed out of the process fluid vent/drain. The pump then “recharges from gas removal reservoir 30” by opening DIV 2, 5 and 7 and closing valves 1, 3, 4, 6, 8 and 9 and retracting the piston from EOD to HRP. Step 2 is repeated three times, which recirculates the fluid and helps accumulated air from the filter in the gas removal reservoir 30. The gas removal reservoir 30 expels the air out of the gas removal reservoir vent/drain in all three steps.

The whole filter has been primed when all of the bubbles have been collected at the top of the gas removal reservoir 30 and the filter output line is void of air. The pump will run a few more recirculation cycles that recharge from the source in order to push new liquid into the gas removal reservoir 30 and vent the air bubbles. Step 3 repeats step 1 four times. This step is programmed to be repeated at least four times to ensure process fluid comes out the filter output line without the presence of air bubbles. If the filter has air bubbles present, the user can input the command until no air is seen exiting the filter output line.

Startup Operations

A description of the startup process of the pump system 22 is as follows:

Initial Pump Filling and Priming

The pump system 22 arrives on location containing only the pumping fluid housed in the pump body 22A. The initial filling and priming process helps to fill the flow path of user's desired processing fluid. This process requires a pre-existing fluid source with a pressurized BIB at the inlet of the pump 22, a Fab reservoir FR with a Fab reservoir vent/drain valve 14, and an optional external dispense valve (external digital valve 9) to provide more customizable dispense control at the outlet of the pump. Upon pump installation, the user connects the fluid lines to the pump system 20. This includes the line from the process fluid source FR to the pump inlet, the fluid outlet lines to the point of external dispense valve, and the external track drain line from the pump system filter vent and gas removal reservoir drain. The pressurized nitrogen (or dry air) line and the vacuum line need to be connected to pump system 20 for valve controlling.

The initial filling and priming is followed by completion of pump auto-balance. The initial filling and priming process begins with the user starting the software process for this operation. There are two scenarios in the customers' location:

Scenario 1: The first scenario is that the BIB is pressurized. A track reservoir (i.e., Fab reservoir FR) may be in place between the initial source and the pump system 20. If so, the pump controller 38 first closes the Fab reservoir vent/drain valve 14 and valve 1 located in the flow path between the initial source and the pump inlet; fluid is then pushed into the Fab reservoir FR by the pressurized BIB. Once the source is pressurized, the pump controller 38 opens the following valves: the valve 1 isolating the internal gas removal reservoir from the source inlet, the valve 2 isolating the gas removal reservoir 30 to the process fluid chamber 34B, the valve 3 isolating the process fluid chamber 34B from the external valve block flow path connected with the filter fluid inlet, the valve 5 separating pumping fluid from the piston chamber 28 and process fluid chamber 34A, and the external point of the dispense valve.

The following valves are closed to direct the fluid through the desired path: the Fab reservoir drain/vent valve V_(FAB), the valve 7 isolating the gas removal reservoir 30 from the drain line, the valve 6 controlling the flow from the filter vent to the external drain line, and the valves 4, 6 and 10 controlling fluid flow from the filter outlet back to the gas removal reservoir 30. The user controls the closing of the open valves to accommodate the varying time required to fill the pump system 20 and attached tubing. The varying time required to complete this process is a result of the varying internal total volume of the tubing connecting the pump system 20 with the initial fluid source FR and point of dispense as well as the varying flow rates. These rates are functions of such fluid characteristics such as density, viscosity, and temperature. Other factors with limited effect would be the density of the surrounding air and the flow rate of the external point of the dispense valve. Once the process fluid travels to the point of dispense, the majority of the volume in the pump system 20 has been filled with the process fluid.

Then, valves 3, 4, and 5 are opened to dispense into the gas removal reservoir 30 while all other valves stay closed. The maximum recharge from the source line is the following action by opening valves 1, 2 and 5. This serial action ends when the automated pressure feedback in the pumping fluid reservoir 32 meets the pressure criteria in the gas removal reservoir 30. Then the filter change routine and recirculation operation are required.

If the Fab reservoir FR is not in the track, the pump system housing can be directly filled by the same procedures without filling the Fab reservoir FR first.

Scenario 2: The second scenario is that the BIB is not pressurized and a Fab reservoir FR is in place between the initial source and the present invention pump system 20. The pump system 20 and Fab reservoir FR need to be filled by pump system 20 itself. It starts from a maximum dispense to the point of the external digital valve by only opening valves 3 and 5, and the external digital valve 9. Then it is followed by a maximum recharge from the source line by only opening valves 1, 2 and 5. This serial action ends when the Fab reservoir FR is filled and process fluid comes out of the dispense tip.

Afterwards, valves 3, 4 and 5 are opened to dispense into the gas removal reservoir 30 while all other valves stay closed. The recharge from the source line will be the following action by opening valves 1, 2 and 5. This serial action ends when the automated pressure feedback in the pumping fluid reservoir 32 meets pressure criteria in the gas removal reservoir 30. Then the filter change routine and recirculation operation are required.

If the Fab reservoir FR is not in track, the pump system housing can be directly filled by the same procedures without filling the Fab reservoir FR first.

Maintenance Operations

A description of the maintenance operations of the pump system 20 is as follows:

Fluid Recirculation and Purging

The pump system 20 incorporates a fluid recirculation function to reduce the process fluid waste during the process of purging any air from the interior of the pump 22. This function allows the user to reduce the total cost of ownership for the pump system 20 through reducing the fluid consumption during purging as well as allowing the pump system 20 to periodically internally recirculate the fluid. The ability to periodically recirculate the process fluid reduces the possibility fluid could become static in the tubing, preventing the fluid from congealing or drying and thus causing stoppages.

The internal fluid recirculation in the pump system 20 begins with the piston 26 at the HRP. The pump controller 38 opens the valve 3 controlling flow from the process fluid chamber 34B to the filter inlet, the valve 4 controlling the flow from the filter return outlet to the gas removal reservoir, and the valve 7 controlling flow from the gas removal reservoir to the drain line. This valve must be open to allow the recirculated fluid to fill the reservoir 30 and displace any air or other gases out of the drain line. All other valves must remain closed. The pump controller 38 performs a maximum volume dispense, closes the open valves, and opens the valve 2 controlling flow from the gas removal reservoir 30 to the process fluid chamber 34B and the valve 7 controlling flow from the gas removal reservoir 30 to the drain line. During the entire recirculation process the point of dispense valve must remain closed.

During the recirculation process the internal fluid flow traps any atmospheric bubbles in the gas removal reservoir 30 or the filter 42 near the drain connections. The pump 22 displaces process fluid into the gas removal reservoir 30, and the collected bubbles of air or other gases along with a small amount of process fluid will be forced into the drain line. This process will occur twice, once to purge the filter vent and again to purge the gas removal reservoir 30. During the filter purging process, with the piston 26 at the HRP, the valve 3 controlling flow from the process fluid chamber 34B to the filter inlet, and the valve 6 controlling flow from the filter to the drain line open while all other valves remain closed. The two open valves will close, and the valve 1 from the process fluid source FR to the gas removal reservoir 30 and the valve 2 between this reservoir 20 and the process fluid chamber 34B will open to allow the piston 26 to recharge from source. During the gas removal reservoir purging process, the valve 2 controlling flow from the process fluid chamber 34B to the gas removal reservoir 30 and the valve 7 controlling the flow from the gas removal reservoir 30 to the drain line will open. All other valves will remain closed. The two open valves will close and the piston 26 will recharge from the source.

Electronics Enclosure 23 Removal

To assist with in track repairs, the pump 22 also allows for electronics replacement with ease. The electronics enclosure is completely self-contained and can be easily removed by simply disconnecting the cables and pulling the box out.

To remove the electronics enclosure, the user needs to disconnect five external connections. Two RJ45 connectors, one serial connector, one power connector and then, once these operations have been completed, the user can then disconnect the DB44 connector to disconnect the electronics enclosure 23 from the pump body 22A itself. The enclosure 23 can now be slid upward and out to disconnect the box from the mount and can be taken out of the cabinet. A new electronics enclosure 23 can now be installed by reversing the removal procedure.

Pump Head in Track Removal/Repair/Replacement

To remove the pump head 22A for in track maintenance purposes, the pump head housings, including the process fluid chamber 34B and gas removal reservoir 30, need to be emptied by running the “System Drain” function. This operation allows the user to nearly empty the process fluid in the process fluid chamber and gas removal reservoir. Hence, the pump head 22A can then be removed by unscrewing six screws on the back plate. When removing the pump head 22B the user needs to be careful to keep the PTFE head (white) and the back plate (stainless steel) pressed together and removed as one unit. The screws are also to be kept together as one with the pump head 22B. The pump head 22B with six screws can be slowly taken off from the pump body 22A, and the pump head block 78 should be held tightly while it is taken off with a backwards tilted angle; the user needs to be prepared for a small amount of process fluid residuals in the process fluid chamber 34B and gas removal reservoir 30 to leak out.

Users can change all the components on the pump head 22B (FIG. 6), including the pump head block 78, pump head O-ring 207, flare fitting 47, flare fitting cap 350, set screws 111, head diaphragm 84, pump head pneumatic plate 80, pneumatic quick disconnect 95, screws 99, gas removal reservoir O-ring 281, valve O-rings 117, mounting foot 261, and elbow fitting 93. All the tubing connected to the gas removal reservoir 30 can also to be replaced/changed. The user can change one item or multiple items when the pump head 22B is taken off, or the complete pump head 22B can be replaced. An auto-balance cycle must be run after the pump head 22B is reinstalled since the pressure in the pump system 20 will be affected by the change.

Pumping Fluid Chamber Diaphragm Replacement

Users would replace the pumping fluid chamber diaphragm 36 when it is extremely deformed or out of shape. To perform this action, the pump head 22B needs to be emptied using the “System Drain” function. The pump head 22B needs to be removed as described in the “pump head in track removal/repair/replacement” section. Then the pump 22 needs to be put in the special maintenance mode as described in the “in track drive assembly change” section that allows pumping fluid only to be able to transfer between the piston chamber and pumping fluid reservoir 32 to isolate the pumping fluid chamber 34A. The user needs to take off the bleed screw from the bleed screw port BP2 to the pumping fluid chamber 32. Then using the provided syringe (FIG. 13) with thin tubing attached, draw the pumping fluid out of the pumping fluid chamber 34A until a very small amount of pumping fluid is left at the bottom of the pumping fluid chamber 34A to block the flow path. The user can save the pumping fluid in a container and reuse it after placing the new diaphragm. The pumping fluid chamber diaphragm hold down plate 64 (FIG. 4) can be removed by unscrewing all the screws 66. When removing the hold down plate 64 and diaphragm 36, the user needs to tilt the pump body 22A in order to keep residual pumping fluid at the bottom of pumping fluid chamber 34A and reduce leaking. The user needs to be aware of the residual pumping fluid around the diaphragm and be prepared for a small amount of leaking.

This allows the user to change/replace the following parts (see FIG. 4): bleed screw 52E on the pumping fluid chamber 34A, pumping fluid chamber O-ring 211, pumping fluid chamber diaphragm 36, pumping fluid chamber diaphragm hold down plate 64, and screws 66. After the new pre-stretched diaphragm with hold down plate and screws are reinstalled, the user needs to fill up the process fluid chamber 34B with the provided syringe (FIG. 13) and reuse the pumping fluid from the pumping fluid chamber 34A. Slowly inject pumping fluid to the pumping fluid chamber 34A through bleed port BP2 (FIG. 4) until the pumping fluid appears to overflow from bleed port BP2. The bleed screw 52E needs to be installed back on the process fluid chamber 34B. After the pump head back is reinstalled onto the pump body 22A, the special maintenance function needs to be disabled as described in “in track drive assembly change” with closing valve 8 and opening valve 5. That allows the pump system 20 back to regular maintenance mode. The pump system 20 is required to run an auto-balance after a pumping fluid chamber diaphragm 36 replacement and after a process fluid chamber diaphragm 84 replacement.

Pressure Sensor Calibration:

The purpose of pressure sensor PS calibration is to set a default “zero” pressure when the pump internal pressure is equalized to atmospheric pressure. The pressure sensor PS needs to be calibrated when pumping fluid reservoir bleed port BP1 is uncapped and all valves in fluid path are open. Place the unit in maintenance mode. All valves can be opened by typing “VON1, 0” in command input line in the GUI. Then the pressure sensor default can be set through the GUI recipe page. Thus, the user can set default “zero” pressure through “set pressure to zero” feature in the GUI. This operation is essential since many operating locations will have different atmospheric pressures than the manufacturing location and this allows for the pump 20 to be calibrated for that particular locations ambient atmospheric pressure.

Recirculation:

The Recirculation feature (see FIGS. 16A-16B) of this pump 20 is a feature that helps reduce the air in the tubes that forms from various places (such as in the filter) and allows for a small circulation system to permit fluid movement while the dispense portion of the pump is idle. This feature may be turned on or off as designated by the user. The Recirculation feature is activated or deactivated while the pump is in “Maintenance Mode” and is completed by selecting the “enable” or “disable” command from the “Maintenance” window, Recirculation tab of the GUI or by the RMVC subsystem. When the recirculation feature is deactivated, the valve 4 for the recirculation line is closed (on the Filter Block 40) and process fluid moving out of the process fluid chamber 34B and into the filter 42 simply continues on its path in the dispense tube. If the Recirculation feature is activated however, the pump 20 opens valve 4 during a dispense and keeps the external valve closed. This operation opens valves 3, 4, 5, and 7 to allow for dispensed process fluid to move into the gas removal reservoir 30. With valve 4 open, there is a back pressure due to the incompressibility of the fluid which does not allow the fluid to continue in the dispense tip path and the fluid is then forced into the recirculation line. The fluid dispensed during recirculation is “dispensed” into the gas removal reservoir and displaces the air pocket that is kept in the gas removal reservoir. Valve 7 is opened as well to allow for the displacement of air as the process fluid is forced into the gas removal reservoir 30. The pump 22 “recharges” from the gas removal reservoir 30 by opening valves 2, 5, and 7 filling the process fluid chamber 34B with the same volume of liquid that was pushed into the gas removal reservoir.

Drain Function:

The system 20 has a drain feature (FIGS. 24A and 24B) that is used in the draining of the pump of process fluid to allow for certain maintenance functions to occur. Once a SYSTEM DRAIN has been performed, the filter must be discarded. This operation removes most of the fluid that is stored in the gas removal reservoir 30, the process fluid chamber 34B and the recirculation line, but there will be some residual fluid in the pump 22. The filter 42 will still hold some of its volume amount of fluid. The System Drain function is activated or deactivated while the pump is in “Maintenance Mode” and is completed by entering the command SDRN1 to enable or SDRN1 to disable. Before the SYSTEM DRAIN can be completed, the user must disconnect and cap off the source line from the pump to allow for the introduction of air into the pump system. This function begins the pump is a user-operated loop that drains the pump of process fluid. This operation begins with a purge to output operation to the full 11 mL by opening valves 3 and 5, external dispense valve such as the LP Digital Valve 9. Once the pump 22 has completed this dispense it closes valves 3 and 5 and the external valve. The pump then “recharges” from the gas removal reservoir 30 by opening valves 1, 2 and 5 and pulling in 11 mL of air. The pump continues with the system drain operation by closing valves 1, 2 and 5 and opening valves 3, 4, 5 and 7 to push fluid out of the recirculation line into the gas removal reservoir. The pump then closes valves 3, 4, 5 and 7 and opens valves 2, 5 and 7 and pushes fluid out of the gas removal reservoir drain line and then closes valves 2, 5 and 7. This series of operations is repeated until the user disables the System Drain function. This function removes process fluid from the pump 22 allowing for the removal of the pump head 22B.

System Drain Operation

-   -   1. Remove and cap FAB source line     -   2. Purge to output         -   a. Opens 3, 5, DV         -   b. Valves 1, 2, 4, 6, 7, 8 closed (DV at any state)         -   c. Recharge from source             -   i. Opens 1, 2, 5             -   ii. Valves 3, 4, 6, 7, 8 closed (DV at any state)     -   3. Recirculation         -   a. Opens 3, 4, 5, 7         -   b. Valves 1, 2, 6, 8, DV closed         -   c. Recharge from gas removal reservoir             -   i. Opens 2, 5, 7             -   ii. Valves 1, 3, 4, 6, 8 closed (DV at any state)     -   4. Purge to vent         -   a. Opens 2, 5, 7         -   b. Valves 1, 3, 4, 6, 8 closed (DV at any state)         -   c. Recharge source             -   i. Opens 1, 2, 5             -   ii. Valves 3, 4, 6, 7, 8 closed (DV at any state)     -   5. Repeat steps 2-4 (until the user sees that no fluid comes out         of the dispense tip or the gas removal reservoir drain line)         Ship Function

This ship function is a feature programmed into the pump 20 which is used to remove all air from all of the pumping fluid chambers and reservoirs. This function is to be used during assembly and operates by pushing all of the pumping fluid from the piston chamber 28 to the pumping fluid reservoir 32. This operation is completed by the user removing the bleed screw BP1 on the pumping fluid reservoir 32 and inputting the command “SHIP1”. This command opens valve 8 and advances the piston downward to the 11 mL end of dispense (EOD) mark. This moves the piston 26 to the bottom of the piston chamber 28 while pushing the pumping fluid to the pumping fluid reservoir 32 and pushing the air in the pumping fluid reservoir 32 out of the pump. The user will see a little bit of pumping fluid emerge from the pumping fluid reservoir 32. The user then caps the bleed port BP1 on the pumping fluid reservoir with the bleed screw and the pump body now is void of air and is ready for shipping.

Out of Box Operation (FIGS. 25A and 25B):

The pump 22 arrives on location to the user with the pump body completely filled with pumping fluid and void of any air. The user then installs the pump 22 into the track system and remove the pumping fluid reservoir bleed port screw. The pump inlet needs to be connected with users' fab reservoir outlet or the in track reservoir outlet if it is provided. The pump outlet needs to be connected to the lab dispense outlet and an external digital valve 9 if it is provided. The external drain line needs to be connected from filter drain line to an outlet in the fab. Once power is supplied to the pump, the pump begins its auto balance procedure and since the piston 26 was at its 11 mL EOD position the pump will return to HRP by opening valve 8 and retracting. This process pulls 11 mL of air into the pumping fluid reservoir 32 and then continues with its auto balance processes. Once the pump 22 has completed the auto balance, (bearing in mind that this is where the user may need to perform a pressure sensor calibration since atm pressure is different at different altitudes) the user can now cap the pumping fluid reservoir bleed port BP1. At this point, the pump 22 is ready to complete the priming procedures and is close to being operational.

Customizeable Pressure Alarms

The pump system 20 also allows users to customize the overpressure setting for the pressure alarm according to operation pressure at the users' location. Users can also set the duration for the over pressure alarm. Users can input the command “OVRPd,x” into the command line in the IDI or LYNX GUI for this purpose. “d” is the overpressure duration in ms. Users can set the value between 0 and 999 ms. “x” is the pressure limit to trigger the pressure alarm. There are two pressure values users can use; one is 28 psi, which can be represented by “1”; the other is 50 psi, which can be represented by “0”. For example, “OVRP125,1” sets overpressure duration to 125 ms @ 28 psi.”

Changing the Motor/Piston Assembly (Drive Assembly Change)-FIG. 26

The pump system 20 includes the ability to remove and replace the mechanical drive assembly 24 with inside without breaking the flow path. As mentioned previously, this drive assembly 24 (FIGS. 8-9) comprises the electrical DC motor 24E, lead screw 24G, piston 26, Polytetrafluoroethylene (PTFE) wiper ring 191 and accompanying hardware. The accompanying hardware includes the guide bearing 24F, anti-rotation flag 56, bolts 24A-24D for holding down the motor 24E and piston O-rings 74.

The drive assembly 24 replacement is designed to take place with minimal disturbance to the pump system 20. Drive assembly replacement requires the removal of the enclosure, the four motor mount bolts, motor power plug, and the pumping fluid reservoir bleed port BP1 screw.

The drive assembly replacement process allows the drive assembly to be removed, repaired, and replaced without disturbing the process fluid flow path. This eliminates the risk of exposing the process fluid chemicals to air and other contaminants, and reduces the amount of process fluid and amount of requalification time needed to release the tool back into production.

The drive assembly replacement process (FIG. 2) begins when the user enters the drive assembly change procedure in the connected software of microcontroller 38. There are two ways that drive assembly replacement can be accomplished depending on the pump operation program interface: using the GUI or by using the RMVC subsystem operational interface

(1) Using the GUI (FIG. 13A, 13H or 13L)

-   -   a. The pump 22 needs to be put in maintenance mode, which allows         valve 5 to separate pumping fluid from the piston chamber 26 and         process fluid chamber 34B to be open. By typing the “SPCF1”         command in the command input line, this allows the pump 22 to         enter into a special maintenance mode while closing valve V5,         separating pumping fluid from the piston chamber 28 and pumping         fluid chamber 34A. At this stage the user needs to activate the         push button switch 25A (FIG. 3), which is attached onto the PCB         pressure board 48, to the “ON” position to open valve 8. That         allows an open flow path for pumping fluid between the piston         chamber 28 and pumping fluid reservoir 32.     -   b. Next, the pumping fluid reservoir bleed port screw for port         BP1 needs to be removed. User needs to install the provided         syringe (FIG. 13) by screwing the male end to the pumping fluid         reservoir bleed port BP1. The syringe plunger is drawn at end of         the syringe. This allows air exchange between the pumping fluid         reservoir 32 and the syringe chamber during the drive assembly         replace process. The connection of the syringe also enables the         pump 22 to move pumping fluid in the piston chamber 28 to the         shoulder position 200 (FIG. 10). By removing four bolts 24A-24D         holding down the motor 24E and unplugging the motor power from         PCB pressure board 48, the drive assembly 24 can be gradually         pulled out of piston chamber 26.     -   c. Next, the user needs to slowly push air through the syringe         to the pumping fluid reservoir 32 to raise the pumping fluid         level in the piston chamber 26 approximately to the shoulder         200. The new or repaired drive assembly with the piston located         at the home position can be slowly inserted into the piston         chamber 26. The assembly should be oriented with the conical         portion 76 of the piston 26 facing downward into the piston bore         28. The motor 24E should be oriented so that the wires that         connect the motor to the pressure PCB 48 are located just above         the pressure PCB 48. The piston 26 should be oriented so that         the anti-rotation flag 56 easily fits into the clearance channel         and the conical section of the piston is centered in relation to         the piston bore when the drive assembly is held vertically         (electrical drive motor 24E on top and piston 26 facing straight         downward). The drive assembly 24 should be lowered until the         conical section of the piston 26 is inside the piston bore 28         and the drive assembly 24 is resting on the lower (furthest from         the electrical drive motor) O-ring 74. The conical shape 76 of         the piston 26 causes the pumping fluid and air to be displaced         and the fluid level rises to completely fill the volume below         the lower O-ring 74.     -   d. Next, the four bolts 24A-24D need to be reinstalled to hold         down the motor 24E, and the motor power needs to be plugged back         on the PCB pressure board 48. The syringe (FIG. 13) can be         removed by unscrewing it from the pumping fluid reservoir bleed         port BP1.     -   e. Finally, the user can flip the switch that is attached to the         PCB pressure board 48 back to the “OFF” position. This permits         valve 8, separating the piston chamber 28 and pumping fluid         reservoir 32, to be closed. By typing “SPCF0” in the command         input line, that disables the special maintenance mode and puts         the pump 22 into regular maintenance mode by opening valve 5.         The auto-balance proceeds then needs to be conducted in order to         ensure that the piston 26 is back to its reference home position         HRP. Upon completion of the auto-balance, the user needs to         reinstall the pumping fluid reservoir bleed screw back onto the         pumping fluid reservoir bleed port BP1.

(2) Using the Remote Monitoring, Viewing & Controlling (RMVC) Subsystem

-   -   a. By using the RMVC subsystem operational interface (FIGS.         13D-13G), maintenance can be enabled by clicking on the         “Enter/Exit Maintenance” button on the maintenance page. Under         “Advanced” tab, it includes the drive assembly function. By         clicking on “Change Drive Mechanism” tab, the drive assembly         replacement procedures are shown on each following tabs. By         clicking on “Enable Drive Change” tab, this closes valve 5,         separating the pumping fluid in the piston chamber 28 and         process fluid chamber 34A to separate pumping fluid in the         piston chamber 28 and pumping fluid chamber 34A while opening         valve 8, separating the piston chamber 28 and pumping fluid         reservoir 32.     -   b. At this point, the steps of 1(b)-1(d) above for the “Using         the GUI” are implemented.     -   c. For the last step, the user can click on the “Disable Motor         Change” tab. This closes valve 8 and opens valve 5. The user         then clicks on the “Autobalance” tab to assist the piston 26         back to the home reference position HRP. Upon completion of the         auto-balance procedure, the user needs to reinstall the pumping         reservoir bleed screw back onto the pumping reservoir bleed port         BP1.         Test of Gas Pressure in Piston Chamber after Drive Assembly         Change in Track

This operation helps the user to determine if any air was introduced into piston chamber during the drive assembly change process. Before the drive assembly change, it is recommended to run the Gas in Piston Chamber Detection procedure (FIG. 28). This process can be run at any time before the drive assembly change, for example, before or after the System Drain procedure has been run. This procedure goes through a series of steps which monitor the increase in pressure over the linear distance the piston travels. If the system experiences a pressure alarm within 0.1 mL of linear distance traveled or has a change in pressure over change in distance, DP/DX, of over, by way of example only, 5, then the piston chamber 28 is void of air. This assists the user in determining whether or not air was in the system prior to the drive assembly change and after the pump has been reassembled, the user again runs the Gas in Piston Chamber Detection procedure. The procedure indicates if air is in the piston chamber 28 after the drive assembly change. This gas detection sequence simply indicates to the user that if the system was void of air prior to the drive assembly change and if air is detected in the system after the drive assembly change, then the air was introduced during the drive assembly change itself. If the Gas in Piston Chamber Detection procedure detects air in the system after a motor assembly change, the user must re-run the drive assembly steps to ensure that there is no air in the piston chamber 28.

Filter Cartridge Change:

A filter 42 is replaced by the user simply lifting up the release lever of the filter bracket and sliding out the old filter. The user slides in a new filter 42 and pushes down on the release lever which fixes and seals the filter 42 in place. The user then runs the PPRM2 and PPRM3 operations to fill and prime the filter housing and substrate and purge the filter of air.

Auto-Balance

The pump system 20 incorporates an auto-balancing (see flow chart in FIG. 17) to equalize the pressure in the pump head(s) as well as to correct any inconsistency in the amount of fluid contained in the process fluid chamber(s) when the pump is in an “at-rest” position. This function allows the user to perform many maintenance functions without requiring the removal of the pump from the enclosure or the removal of the lower enclosure from its mounted position. This function also allows the pump to maintain a repeatable volume of fluid into the process fluid chambers, allowing for better control of the dispense characteristics of the pump and to prevent the possibility of damaging operations from occurring. The auto-balancing process every time power is applied to the pump or with the user starting the software process for this operation. The Auto-Balance begins its operation by checking if the piston is in the HRP. If the piston is not at HRP, the pump then opens valve 8 and pulls the piston 26 back to HRP while pulling pumping fluid out of the pumping fluid reservoir 32. Once the piston is at HRP or if the piston 26 was originally at HRP, then the auto balancing procedure continues. The pump 20 then begins the next step by opening valve 8 and moving the piston 26 forward to push 4 mL of pumping fluid into the pumping fluid reservoir 32. The pump 20 then closes valve 8 and opens valve 5 (the two isolation valves) and begins to retract the piston 26 to HRP while monitoring the pressure on the pressure sensor PS. The pump 20 stops if a pressure reading of negative 4.0 psi is detected or when reaching the HRP. If the pump 20 reaches a pressure of negative 4 psi, then the pump 20 continues with the auto balance, but if the pump reaches the HRP without reaching the desired pressure, then the pump 20 repeats the process of pushing fluid into the pumping fluid reservoir 32 via valve 8 and then closing valve 8 and opening valve 5 and recharging from the pumping fluid chamber 34A until the desired negative pressure is reached. Once the desired pressure is reached, it closes valve 5 and opens valve 8 and returns the piston 28 to HRP pulling pumping fluid from the pumping fluid reservoir 32 and then closes valve 8. The pump then opens valve 5 and moves the piston 26 forward to push 1.5 mL into the process fluid chamber 34B and stops. The pump 20 then closes valve 5 and opens valve 8 and returns to HRP. At this time, the pump 20 is finished with the “Auto Balance” and has done all of the procedures needed to keep a consistent amount of pumping fluid into the pumping fluid chamber 34A.

In particular, the head auto-balancing process begins with the user starting the software process of the microcontroller 38 for this operation. The pump controller 38 prompts the user to remove the pumping fluid reservoir bleed port screw from the universal elbow fitting located on the upper front face of the pump 22 (side of the pump body located farthest from the enclosure mounting bracket) at the port BP1. The pump controller 38 then opens the isolation valve 8 separating the piston chamber 28 from the pumping fluid reservoir 32. The pump controller 38, via the motor drive assembly 24, then drives the piston 26 to the end of the dispense position (the farthest position from the at-rest home position, equal to the position stopped at during an 11 ml dispense) effectively emptying the piston chamber 28 of fluid. The pump controller 38 then closes the isolation valve 8 separating the pumping fluid reservoir 32 and the piston chamber 26 and opens the isolation valve 5 separating the piston chamber 26 and the process fluid chamber 34A.

At this point, the pump controller 38 drives the piston 26 to enter a slow recharge movement towards the home position while the pump controller 38 continually monitors the pressure. Once the pressure transducer PS detects that the pressure in the chamber 28 is at atmospheric pressure (0 psig) the pump controller 38 continues to recharge, but at a reduced velocity. The piston 26 continues to return to the home position at the reduced rate until the pressure transducer PS detects a sufficiently negative pressure (negative pressure refers to the pressure differential between the internal pump body pressure and local atmospheric pressure; this is not a user variable). Once the internal pump body pressure reaches this level, the piston 26 begins to dispense at the same reduced velocity it recharged by. The pressure transducer PS again continually monitors the internal pump body pressure as the piston 26 dispenses. Once the pressure transducer PS indicates the internal pump body pressure equals atmospheric pressure, the piston 26 then stops.

The isolation valve 8 separating the piston chamber 28 and the pumping fluid chamber 32 closes and the isolation valve 8 separating the piston chamber and the pumping fluid reservoir 32 opens. The piston 26 then returns to the home position, pulling fluid from the pumping fluid reservoir 32. Once the piston 26 has returned to the home position, all valves close and the pump controller 38 prompts the user to replace the pumping fluid reservoir bleed port screw at the port BP1 to seal the pumping fluid reservoir 32.

Dispense Detection

The dispense detection feature is intended to detect many of the common causes of wafer coating problems, including:

-   -   Air in dispense line     -   Dispense/Suckback valve malfunction     -   Clogged nozzle     -   Kinked tubing     -   Dispense line Leaks

Dispense detection works by comparing the pressure profile for each dispense to a reference pressure profile. If the two profiles do not match within a user selectable sensitivity, the pump generates an alarm.

Whenever any change is made to a recipe, a new reference profile will be saved. The event log records each time a new reference profile is saved.

Operation:

The user begins running dispenses; the dispense detection is set and runs to record the Golden Sample after any change to a recipe. Once a Golden Sample is stored, any dispense that deviates by more than a user programmed percentage and number of counts out of the limits will stop the pump 20 and trigger an alarm.

Dispense Detection may be used with pressure sensor PS (or, e.g., Isense that models pump pressure based on motor current) providing the pressure profile data.

Pressure Sensor:

Pump chamber pressure is measured directly.

Isense Functionality:

Pump chamber pressure is inferred as described below.

Isense H/W:

Current is sensed via the voltage drop across the stepper motor driver sense resistors (FIG. 14). Each phase is half-wave rectified with an active rectifier. The rectified signals are then summed and integrated. Stepper noise is removed with an envelope detector. The resulting signal is dc amplified and voltage translated such that the voltage window of interest is translated to the maximum limits of the A/D converter. This allows utilization of the maximum resolution of the A/D.

Isense F/W:

Initial calibration is done by running the motor at each operating rate & storing the unloaded “baseline” A/D value.

Motor load is obtained by subtracting the baseline from the present sample. This yields a value proportional to the motor load. This value is gain corrected for any non-linear & rate related artifacts.

Alternate Dispense Detection Quality Reporting:

A dispense alarm occurs when any dispense deviates, from the reference dispense, by more than a user programmed percentage and number of counts out of the limits.

After each dispense, a “Dispense Quality” number is displayed. This number is shown as a percentage. If 100% of the dispense counts are within limits, “Dispense Quality”=100% is displayed. If 50% of the dispense counts are within limits, “Dispense Quality”=50% is displayed. The dispense may be divided into segments and each segment's “Dispense Quality” may be reported separately.

Alternative Embodiment Supporting Filter Recirculation and Nitrogen Supply to Gas Removal Reservoir

FIGS. 15 and 15A depict an alternative embodiment of the precision pump system 20 that includes additional DIV valves (10-13) and venturi that permit the recovery of process fluid entrained within the filter 42 during a filter recirculation process. Typically, to remove the trapped gas in the filter 42 to the filter drain, process fluid entrained within the filter 42 is also discarded too. However, with the inclusion of valves 10 and 11, it is possible to remove the trapped gas from the filter but to recirculate the trapped process fluid from the filter 42 back to the gas removal reservoir 30. To further supplement this filter vent recirculation (FVR) process, FIG. 15B is provided which depicts the sequence of valves utilized to effect the FVR process. In particular, the first step is to determine whether the piston is at HRP and if it is, valves 1, 3, 5 and 10 are opened to advance the piston to displace 11 mL of process fluid; if the piston is not at HRP, a recharge operation (FIG. 18) is performed first to establish HRP and then valves 1, 3, 5 and 10 are opened to displace the predetermined 11 mL of process fluid. Once that amount is displaced, those four valves are then closed and a recharge operation is performed.

In addition, should microcontroller 38 detect that all gas has been removed from the gas removal reservoir 30, in order to re-establish a gas head within the gas removal reservoir 30, a nitrogen N₂ source is coupled to the top of the gas removal reservoir 30 via a DIV valve 12. The pump controller 38 can permit a predetermined amount of nitrogen to form a gas head within the gas removal reservoir 30. This N₂ is pre-filtered before being delivered to the valve 12 and then to the gas removal reservoir 30 at a regulated 20 psi.

Gas Detection Algorithm and Gas Volume Detection Algorithm

The gas detection algorithm is required to automatically prime the filter 42, and the gas volume detection algorithm is important for operation with the gas removal reservoir 30. See FIGS. 27A-27B for Gas in Filter Detection Algorithm; FIGS. 28A-28B for Gas in Piston Chamber Detection Algorithm; and FIGS. 29A-29B for Gas Volume in Gas removal reservoir Detection Algorithm.

The sequences below refer to the distance rate of change of pressure (dp/dx) but they could also be made to work equally well using the time rate of change of pressure (dp/dt) as long as it is correlated back to the distance traveled based on the speed of travel of the piston 26—since that ultimately correlates back to a volume change—and all of this is based on the ideal gas law correlating volumes and pressures of a gas that experiences a volume change without experiencing any significant change in temperature.

The key principal in both of these algorithms is that the piston 26 is advanced in a closed system and the rate of change of pressure is measured. Very high rates of change of the pressure (a pressure spike in the extreme case) indicate there is no gas, whereas low rates of change of the pressure indicate the presence of gas. The actual measured rate of change of pressure can be correlated back to empirically determined values (of rates of change of pressures) to determine an estimate of the amount or volume of gas in the system.

Gas Detection Algorithm (Typically Used to Determine the Presence of Gas in the Filter System, but can Also be Used to Test for the Presence of Gas after the Motor Change Feature)

-   1. Record the pre-charge pressure setting in a global variable -   2. Set the pre-charge pressure to zero and wait for the pump chamber     pressure to equalize to zero. This step isn't required but yields     more consistent results, better results in general. -   3. Close and open whatever valves are necessary to seal off the     portion of the pump that needs to be tested for the presence of gas. -   4. Measure the pressure and record it in a global variable -   5. Advance the piston some distance (nominally 0.5 mL equivalent     displacement); while the piston 26 is advancing execute these steps:     -   a. measure the instantaneous pressure and record it in a global         variable     -   b. calculate the distance rate of change of pressure (dp/dx)         based on the current pressure reading and the initial pressure         reading and the position of the piston 26     -   c. if the rate of change of pressure (dp/dx) exceeds a threshold         value (dp/dx>5 typically indicates no presence of gas in the         system) previously empirically determined to indicate no         presence of gas in the system—then the system is determined to         not have any gas present. -   6. Alternatively a pressure alarm within a 10th of a milliliter of     equivalent distance traveled would also indicate there is no gas     trapped in the system. The optimal value can be empirically     determined based on the physical makeup of the system. -   7. if the piston advanced through the full test distance (nominally     0.5 mL of equivalent displacement) without having a pressure alarm     or exceeding the threshold distance rate of change of piston chamber     pressure—then that section of the pump is determined to have gas     trapped in it. -   8. Close and open whatever valves are necessary to bring the pump     back to its ready state -   9. set the pre-charge pressure to whatever it was before from the     global variable that was used -   10. the pump will take some amount of time to equalize back to the     appropriate precharge pressure     Gas Volume Detection Algorithm (Typically Used to Determine the     Volume of Gas in the Gas Removal Reservoir 30) -   1. Record the pre-charge pressure setting in a global variable -   2. Set the pre-charge pressure to zero and wait for the pump chamber     pressure to equalize to zero. -   3. Close and open whatever valves are necessary to seal off the     portion of the pump that needs to be tested to determine the volume     of gas. -   4. Measure the pressure and record it in a global variable. -   5. Advance the piston some distance (nominally 1 mL equivalent     displacement); while the piston 26 is advancing execute these steps:     -   a. measure the instantaneous pressure and record it in a global         variable     -   b. calculate the distance rate of change of pressure based on         the current pressure reading and the initial pressure reading         and the position of the piston     -   c. if the rate of change of pressure exceeds a threshold value         previously empirically determined to indicate no presence of gas         in the system—then the system is determined to not have any gas         present. -   6. Alternatively a pressure alarm within a 10th of a milliliter of     equivalent distance traveled would also indicate there is no gas     trapped in the system. The optimal value can be empirically     determined based on the physical makeup of the system. -   7. If the piston advanced through the full test distance (nominally     1 mL of equivalent displacement) without having a pressure alarm or     exceeding the threshold distance rate of change of piston chamber     pressure—then that section of the pump is determined to have gas     trapped in it. If the system is determined to have gas trapped in it     then execute these steps:     -   a. calculate the distance rate of change of pressure (dp/dx)         over the piston displacement (nominally 1 mL of equivalent         displacement)     -   b. volume=dp/dx*15 (approximately, and more data will be taken         to get the best empirical correlation)     -   c. if the one milliliter displacement test determines that there         is 20 mL or greater of gas in the system then another test can         be run with a larger displacement to get a more accurate         determination of the exact volume of gas trapped in the system. -   8. Close and open whatever valves are necessary to bring the pump     back to its ready state -   9. set the pre-charge pressure to whatever it was before from the     global variable that was used -   10. the pump will take some amount of time to equalize back to the     appropriate precharge pressure.

It should be understood that the numerical terms in the above algorithms and in the accompanying FIGS. 27A-29B are approximate values that may be subject to change as the pump system is further developed.

It should also be noted that for the gas removal reservoir 30, there are optional apparatus including:

-   -   gas removal reservoir having an inlet for a nitrogen blanket         (low pressure supply of nitrogen that is process filtered); see         also FIG. 15A.     -   there is a valve on the nitrogen blanket supply to turn it off         or turn it on;     -   there is a check valve on the gas removal reservoir drain line         biased to only allow flow out of the gas removal reservoir. This         check valve can be located upstream or downstream of a typically         located drain valve;     -   there is a venturi supply vacuum to pull fluid out of the drain         line, or it may be needed to overcome any pressure differential         that would tend to push fluid back from the drain line into the         gas removal reservoir. The venturi has a nitrogen supply that         also has a valve to turn off or turn on the nitrogen supply so         that the venturi is not running all of the time.

FIG. 30 provides an overview of the major features of the present invention 20, which are also discussed below. Moreover, one of key features of the present invention is a reservoir associated with the pump wherein the valves and any associated fluid control components for the reservoir are controlled by a microcontroller or other device that is in communication with or whose activities are coordinated with any controlling system associated with the pump.

Flow path continuity: This pump has a distinct advantage to others in the field when it comes to maintenance downtime. The use of a diaphragm pump with a pumping fluid and the ability to access a reservoir of this pumping fluid allows the pump 20 to move the fluid between chambers, if needed for repairs. On pump with multiple outputs, the user can change the filter, process fluid chamber diaphragm, or isolation valve on one output without affecting the others.

In track repair: The drive system can be easily replaced without the user needing to take the pump out of the coater/developer. This is made possible by the use of the pumping fluid reservoir and the conical piston head shape. The electronics enclosure is another item that can easily be replaced in the coater/developer. The wiring harness simply unplugs from the pump enclosure allowing it to remain in the coater/developer undisturbed while the electronics enclosure is replaced. It is also possible to change a pump head in the coater/developer as it can be drained of all process fluid and removed. Once the new head is attached to the pump body the system can be auto balanced and returned to production without breaking the flow path.

Predictive maintenance: The pump system 20 has the ability to detect and alert the user to a wearing system part. Different wear parts will cause different recognizable patterns in the dispense profile. The system will recognize these and alert the user of the need to replace the identified troublesome part. These parts include the drive system, the integrated diaphragmatic valves, and the filter.

Possible Detectable Faults:

Leaky piston O-rings

Air in Pumping Fluid

Air in Process fluid

Compressibility during pre-charge

Leaky diaphragmatic valves charge leak down

Filter excessive back pressure

Pump Chamber pressure exceeds limit

Lead screw back lash

Torque changes on motor reversal

Binding Lead screw/Motor

Increasing torque requirements

Digital valve binding

RMVC webcam

Dispense Detection: errors, graphs. The pump system has the ability to detect a good dispense by studying the profiles of the dispenses made. It alerts the user if a dispense is outside of the tolerance set by the user. The system also displays a graphical view of the data collected and how it compares to the baseline data set during the first dispense under the current dispense configuration. Zero Loss Pump: The present invention is directed to achieving zero loss of process fluid by recirculating unused or undispensed process fluid to the gas removal reservoir 30.

Pre-filtration by pulling a vacuum through the filter 42: The gas removal reservoir 30 removes any gases (viz., air) that passes through the filter.

Gas removal reservoir Inlet Configuration: The process fluid source inlet is positioned on the roof of the gas removal reservoir where the side wall meets the roof on the shorter vertical side. The purpose of the source inlet's position is to allow for the process fluid to enter into the gas removal reservoir at an angle near the side edge which allows for the process fluid to smoothly run down the wall of the gas removal reservoir instead of dripping from the top of the reservoir, which can cause the capturing of air as the fluid falls.

Liquid Level Sensor (LLR)

When pre-filtering on a single stage pump, any gas that is generated (i.e., if the vapor pressure barrier is exceeded) is sent directly out the dispense tip. By pulling fluid through the filter and into the top of the gas removal reservoir (or near the bottom by using a sloped design), and then having the fluid flow out the bottom of the reservoir, any gas that was generated by the filter will be removed before exiting the reservoir. In order for the gas removal reservoir to work in a closed system, a gas/liquid interface inside the gas removal reservoir must be maintained. Some semiconductor manufacturing facilities do not allow for outside air to come in contact with the chemical to prevent contamination or particles from entering the process flow, so process grade N2 is used when needed. The amount of N2 and/or fluid can be managed within the reservoir with a program that measures the pressure exerted by the pump when pushing back to the gas removal reservoir, or by using a fluid level sensor (LLS), optical sensor, float sensor, flow meter, pressure sensor/meter, weight measurement device, visual, camera system, or any other means of determining the amount of fluid in the gas removal reservoir.

Gas Removal Reservoir Near the Pump (PRNTP)

During the startup phase and/or filter change, the filter and plumbing (tubing) needs to be wetted with fluid. One of the concerns was over the loss of liquids during this process. To minimize the effect, the system was designed around a (PRNTP) that will recirculate the liquid and remove any air that was in the system to start with or being generated by recirculation of normal filter venting. By filling from the top and pulling liquid out of the bottom of the (PRNTP), an air/liquid separation barrier is achieved (this could also be done by filling from the bottom and pulling liquid out of the bottom). If needed, a small vacuum (negative pressure) could be applied to further aid or speed up the air/liquid separation. The key to reducing liquid waste in the dispensing system is the ability to keep a prescribed amount of air/N2 in the (PRNTP) to allow for fluid to reenter the closed system, which is accomplished by allowing air/N2 to enter the (PRNTP) and/or making sure that there is sufficient air/N2 in the (PRNTP). The (PRNTP) also allows for any fluid released during normal venting of the filter to be sent back to it, thus keeping with a near zero loss of liquid objective. Air/N2 can be added to the system by adding a pressurized line, a pressurized regulated line, open air, vent or drain line. Some of the ways that the amount of air/N2 and/or liquid can be managed are with a program that measures the pressure exerted by the pump when pushing back to the (PRNTP), using a liquid level sensor (LLS), optical sensor, weight measurement device, float sensor, flow meter, pressure sensor/meter, visual, camera system, or any other means of determining the amount of fluid in the (PRNTP).

To do this, 1) all of the valves are closed. 2) Then valves 1 and 2 are opened. The pump head moves in a direction that will generate a vacuum drawing fluid into the (PRNTP), then into the pump head. Pump movement is repeated until the pump head is full. 3) Valves 1 and 2 are then closed. 4) Valves 3 and 4 are opened and the pump head moves in a direction that will generate a positive pressure pushing fluid into and through the filter. Steps 1) through 4) are repeated until the filter is completely wetted. To remove any air trapped inside the filter, steps 1) through 3) are performed. Step 5) opens valves 3 and 10 are opened and the pump head moves in a direction that will generate a positive pressure pushing air out of the filter (to the filter drain). Step 6) runs a program to determine if there is any air left in the filter, and then all valves are closed. Steps 1) through 3) and steps 5) through 6) are repeated until all air has been removed from the filter. To fill the (PRNTP) to the prescribed level, Steps 1) through 3) and steps 5) through 6) are repeated until completed. The last phase is to remove the air from the dispense tip. Step 7) closes all valves and then valves 1 and 2 are opened. The pump head moves in a direction that will generate a vacuum drawing fluid into the pump head. All valves are closed and then valves 3, 11 and 9 are opened. The pump head moves in a direction that will generate a positive pressure pushing fluid out the dispense tip. Repeat step 7) until all air is removed from the dispense line. This procedure allows for minimal if any loss of liquid during the startup phase, filter change, and/or normal dispense (where air is removed/vented from the filter on a predefined, automated, or manual schedule).

Ability to Use Pre/Post Filtration with One Pump-Moving Connections to the Filter

By incorporating the use of an (PRNTP), post filtration can be obtained as shown in the Gas removal reservoir Near The Pump (PRNTP) description where the filter is between the pump and the dispense tip.

By moving the connections to the filter where the filter is located before the (PRNTP), or any reservoir, gas generated from pulling a vacuum to create flow through the filter can be removed to provide for a bubble free dispense. Monitoring filter loading (differential pressure) can be done by measuring pressure with fluid in a new filter and comparing it to the readings obtained during normal use. Pressure readings can be obtained by using a pressure sensor in the pump, using a flow meter, monitoring the current on the motor, and/or with a pressure sensor located before the filter in the fluid path.

FIG. 31 depicts an alternative configuration wherein the filter is located before the gas removal reservoir 30 as well as the recirculation upstream of the filter 42. In particular, the recirculation returns to a point upstream of the filter and downstream of an isolation valve. In this configuration, process fluid is pulled from the pumping chamber 34 through the filter 42 and into the gas removal reservoir 30. Alternatively, a venturi on the gas removal reservoir drain can be used in combination with the gas volume detection system to fill the gas removal reservoir from the filter 42. The gas removal reservoir 30 provides an extra degassing benefit from liquid being pulled through the filter 42. In addition, precise control of the recharge rate can also mitigate any gas introduction.

FIG. 32 depicts another configuration wherein the filter 42 is located after the gas removal reservoir 30 and the recirculation is located either upstream of the gas removal reservoir 30, or downstream of the gas removal reservoir (the latter alternative indicated by the valved path shown in phantom). Where the recirculation occurs upstream of the gas removal reservoir 30, the recirculation line is coupled to a point upstream of the gas removal reservoir 30 and downstream of a closely-associated valve. Process fluid is pulled through the filter 42 directly during a recharge of the pump. Alternatively, when the valved path shown in phantom in FIG. 32 is implemented, the recirculation line is coupled to a point upstream of the filter 42 and downstream of the gas removal reservoir 30 and a closely-associated valve. Process fluid is pulled through the filter 42 directly during a recharge of the pump. This valved path shown in phantom allows for isolation of the gas removal reservoir 30 and the filter 42 so that the filter 42 can be automatically tested for problems, e.g., unable to prime because of broken valve, leaking fitting (loss of seal).

FIG. 33 depicts another configuration wherein the filter 42 is also located before the gas removal reservoir but where the recirculation is downstream of the filter 42. In particular, the recirculation returns to a point downstream of an isolation valve and upstream of the gas removal reservoir 30, or directly into the top of the gas removal reservoir 30. Process fluid is pulled from the pumping chamber 34 through the filter 42 and into the gas removal reservoir 30. Alternatively, the venturi on the gas removal reservoir drain is used in combination with the gas volume detection system to fill the gas removal reservoir from the filter. The gas removal reservoir 30 provides an extra degassing benefit for the process fluid being pulled through the filter 42; again, precise control of the recharge rate can also mitigate any gas introduction.

It should be understood that in all cases of FIGS. 31-33, the gas removal reservoir 30 may include optional apparatus including:

-   -   (1) gas removal reservoir 30 includes an inlet for a nitrogen         blanket (e.g., a low pressure supply of nitrogen that is         process-filtered);     -   (2) a valve on the nitrogen blanket supply to turn it off or         turn it on;     -   (3) a check valve on the gas removal reservoir 30 drain line         biased only to allow flow out of the gas removal reservoir. This         check valve can be located upstream or downstream of a         typically-located drain valve; and     -   (4) a venturi to supply vacuum to pull fluid out of the drain         line, or it may be needed to overcome any pressure differential         that would tend to push fluid back from the drain line into the         gas removal reservoir 30. The venturi has a nitrogen supply that         also has a valve to turn off or turn on the nitrogen supply so         that the venturi is not running all of the time.         Self-Correcting Pump

As with any single or dual stage pump, if the unit has a problem it may have to be addressed during unscheduled maintenance time. There is a need for a pump that has the ability to either self-repair/correct or to continue running until the scheduled maintenance time is available. This allows the pump to continue with production with the official downtime occurring during non-production or maintenance time. To accomplish this, the pump has the ability to measure the current applied to the pump motor. If the current increases over time with no change in the process setup or chemical, this could be the result of a problem with the output valve, electronics, motor, chemical, or filter. The pump could signal the operator that it needs to be looked at soon. If a flow meter is placed after the filter and before the dispense output/suckback valve, it can determine if the valve has opened or closed correctly. If the flow has changed, it could signal the pump to adjust the flow rate to the correct amount. If a flow meter is placed after the filter and after the dispense output/suckback valve, it can determine if the valve has opened or closed correctly, as well as, if suckback occurred correctly. If there is an issue with suckback, the pump could open the dispense valve slightly and then push or pull the fluid to bring the fluid back to the correct level. If the flow has changed for the dispense, it could signal the pump to adjust the flow rate to the correct amount.

Gas Evacuation Process

The system and method of the present invention 20 also implements a gas evacuation process whereby pressure is built up within the pump system (since air is compressible) and a quick vent process is performed to evacuate any air in the system 20. In particular, there is shown in FIGS. 34A and 34B two gas evacuation processes, titled “GASE5” and GASE6”, respectively. The GASE5 process (FIG. 34A) is used as part of the fill routine (also referred to as the Recharge routine, FIG. 18 discussed previously). The GASE6 (FIG. 34B) process is used as part of the recirculation routine. Other than the particular valves used in each process, the two gas evacuation processes are very similar. By way of example only, the gas evacuation threshold pressure is approximately 15 psi. Also by way of example only, the step of advancing the piston at a slow rate to build up pressure is approximately 0.1 mL/sec.

In view of the foregoing, Applicant has further improved upon the pump system of the present invention. To that end, there is shown in FIG. 35 an alternative system configuration 1020 wherein the gas removal reservoir, hereinafter, the gas removal reservoir 1030, comprises an internal vertical partition 1032 to further reduce the formation of air bubbles and improve the removal of air from the system while reducing the waste (i.e., discarding) of process fluid. In particular, as shown most clearly in FIG. 35A, this improved pump system utilizes a redesigned gas removal reservoir 1030 that eliminates the raised top edge, or angled upper face of the gas removal reservoir 30. The internal partition 1032 splits the gas removal reservoir 1030 into two smaller reservoirs, or sub-reservoirs, RS1 and RS2 with an open fluid channel 1036 connecting the two smaller reservoirs RS1/RS2 at the top of the reservoir 1030, where the free end of the internal partition 1032 is located. The fluid inlet 1031 and a separate fluid outlet 1033 are both located at the bottom side of the reservoir 1030; when a pressure differential is created between the inlet 1031 and outlet 1033, process fluid flow through the GRR 1030 is shown by the hatched line 1034. Similarly, a vent/drain line (via valve 7) and a recirculation line (via valve 10) are each located on the top side of the gas removal reservoir 1030, hereinafter referred to as the GRR 1030. As such, the GRR 1030 maintains the advantage of collecting air bubbles 1035 at the top of the GRR 1030, as the process fluid flow 1034 moves from the bottom side/inlet 1031 up and over the partition 1032 and then down towards the bottom side/outlet 1033. The air bubbles 1035 are removed from the flowing process fluid 1034 in the open fluid channel 1036, where they can be evacuated via the vent/drain lines (i.e., via valve 7). In addition, the alternative pump system 20A has replaced the external filter block 40 (FIG. 7) with an integrated valve configuration.

An even further alternative to the GRR 1030, is the gas removal reservoir 1030A, a functional diagram of which, is shown in FIG. 35B. In particular, the internal vertical partition 1032 is replaced with a plurality of interdigitated partitions 1032A that force the process fluid flow 1034A into a sinusoidal flow around the ends of these partitions. The partitions 1032A are located between the inlet 1031A and the outlet 1033A. As the process fluid flow 1034A moves around the ends of these partitions 1032A, as with the GRR 1030, any air bubbles 1035A will be separated above the upper open fluid channels 1036A and vented via corresponding vent valves 7A. In addition, any particulates P in the process fluid flow 1034A will be deposited on the bottom surface of the GRR 1030A underneath the lower ends of the partitions 1032A connected to the top side of the GRR 1030A. Thus, it is within the scope of the present invention 20A to include the GRR 1030 or the multiple internal partition GRR 1030A. It should be further understood that the five walls shown in FIG. 35B is by way of example only and that any number of plural partitions are within the broadest scope of this invention.

FIG. 35C depicts a venturi circuit that can be implemented with the improved system 1020. This venturi circuit along with the DIV valves 10-13 permits the recovery of process fluid entrained within the filter 42 during a recirculation process. In addition, should microcontroller 38 detect that all the gas has been removed from the GRR 1030 or 1030A, in order to re-establish a gas head within the GRR 1030 or 1030A, a nitrogen N₂ source is coupled to the top of the GRR 1030 via a DIV valve 12. The pump controller 38 can permit a predetermined amount of nitrogen to form a gas head within the GRR 1030 or 1030A. This N2 is pre-filtered before being delivered to the valve 12 and then to the GRR 1030 or 1030A at a regulated 20 psi.

FIGS. 36A-36D depict different views of the system 1020 showing the precision pump 1022 and its corresponding electrical control box 1023 that houses the electronics that control the pump 1022, including the microcontroller 38 and the NMM 50 discussed previously. It should be understood that other than the presence of the GRR 1030 or 1030A, the operation of the pump 1022 is similar to the operation of the pump 22 described previously. Furthermore, use of the prefix “10-” in the reference number in FIGS. 36A-41 is meant to convey the corresponding function and operation of the items having reference numbers without that prefix, all of which were discussed earlier.

FIG. 37 is an exploded view depicting the internals of the pump 1022. As with the first system 20, the motor drive 24 sits atop a main pump assembly 1022A and the motor drive 24 can be released from the main pump assembly 1022A in a similar fashion described earlier with regard to system 20. This figure shows the pump assembly 1022A connected with the pump head 1022B. The pressure sensor board 48, also described earlier, is shown in FIG. 37, along with the maintenance button 25A for initiating motor drive 24 removal. As can also be seen in FIG. 37, the filter distribution block 40 of the first system 20 has been replaced with an integrated configuration. The flare fittings 47 are shown on the pump 1022 and the pneumatic valve manifold 1044 operates similarly to the pneumatic valve manifold 44 described earlier. The pump 1022 is positioned within a housing H which receives a side cover SC and a top cover TC and bracket B and all of which can be releasably mounted using a mounting bracket MB.

FIGS. 38A-38B depict opposite side perspective views of the pump head 1022B and showing the dispense chamber 34B. FIG. 38C depicts the alignment for coupling the pump head 1022B with the pump assembly 1022A. FIGS. 38D-38F depict the coupling of the pump assembly 1022A and pump head 1022B in more detail.

FIG. 39 is an exploded view of the pump head 1022 and shows the components, including the DIVs discussed earlier for controlling flows, as well as the relative location of the gas removal reservoir 1030 having the at least one internal vertical partition 1032. The control side of the DIVs is on the plate 1080 which comprises the control port CP surrounded by the channel CH into which an O-ring 1081 is disposed. A diaphragm 1084 is disposed in between plate 1080 and surface 1080A of the block 1078. The output portion of the DIVs comprise the two outlet ports 1083A and 1083B, all in accordance with the DIV operation explained earlier.

FIG. 40A is an isometric view of the pump head block showing the process fluid chamber side of the block, whereas FIG. 40B is an isometric view of the pump head block showing the gas removal reservoir and the side of the pump head block that mates with the valve plate. FIG. 40C is an enlarged perspective view diagrammatically showing the gas removal reservoir inlet. FIG. 41 is a functional diagram showing how the pump head 1022B interfaces with the filter 42.

FIG. 42 provides an alternative pump system configuration 2020 that also achieves a minimum loss of process fluid. In particular, the system 2020 is similar to system 20A except that a flow path 80 is provided from the vent of the filter 42 to the source line SL that feeds valve 1. Furthermore, a separate vent 82 is provided at a high point or apex along the flow path 80. The opening/closing of the vent 82 is controlled by the microcontroller 38 and can be opened/closed at a predetermined interval of time. This configuration 2020 avoids pushing process fluid out of the filter vent and into the filter drain. In operation, the fluid in the flow path 80 is a gas and liquid mixture that flows from the filter vent back towards the source line SL; during this flow, bubbles collect at the high point or apex of the fluid path 80 and are thus vented via the vent 82 via microcontroller 38 command. The airless process fluid is recirculated back to a “T”-type connection in the source line SL. This forces process fluid to flow back into the source line SL into the fab reservoir FB

FIG. 43 provides another alternative pump system configuration 3020 that also achieves a minimum loss of process fluid. In particular, the system 3020 is similar to system 1020 except that the vent 82 is replaced with a valve 90 and a separate filter vent-to-drain flow path 92; in addition, a bubble sensor 94 is inserted into the flow path 80. The valve 90 and bubble sensor 94 are also positioned at a high point in the flow path 80. Valve 90 is also controlled by the microcontroller 38. In operation, the fluid in the flow path 80 is a gas and liquid mixture that flows from the filter vent back towards the source line SL; during this flow, bubbles collect at the high point or apex of the fluid path 80 and when the bubbles are detected by the bubble sensor 94, the valve 90 is opened by the microcontroller 38 to vent the trapped air. The airless process fluid is recirculated back to a “T”-type connection in the source line SL. This forces process fluid to flow back into the source line SL into the fab reservoir FB.

FIG. 44 depicts a further pump system configuration 4020 wherein the pumping chamber 34 is coupled to the inlet of the GRR 1030. In particular, the inlet 1031 of the GRR 1030 is coupled to valve 3 which is connected to the output of the process fluid chamber 34B. The pump system configuration 4020 operates similarly to the system 1020, but the difference is that the GRR 1030 is positioned downstream from the pump chamber and upstream of the filter 42. The process fluid source (e.g., FAB reservoir FR) is directly coupled to the process fluid chamber 34B via valve 1. The pump chamber 34B is also coupled to the input of the GRR 1030 via valve 2. The output of the GRR 1030 is coupled to the inlet of the filter. The advantage of process fluid recovery and removal of air from the system is maintained with the system configuration 4020.

It should be further understood that all of the previous routines/features described herein and disclosed in FIGS. 16A-30 are applicable to all of the various system alternative embodiments described above, including the GASE5 and GASE6 gas evacuation processes.

While the invention has been described in detail and with reference to specific embodiments thereof, it will be apparent to one skilled in the art that various changes and modifications can be made therein without departing from the spirit and scope thereof. 

What is claimed is:
 1. A method of removing gas in a fluid in an automated pumping system, said method comprising: providing an enclosure having an inlet, an outlet and at least one vent; positioning said inlet and said outlet at respective locations at a bottom portion of said enclosure and positioning said at least one vent at an upper portion of said enclosure; causing the fluid having gas therein to flow from said inlet to said outlet via a fluid channel, the gas in the fluid collecting at said at least one vent; (a) closing said at least one vent; (b) increasing the pressure within the enclosure containing the fluid and gas therein to a predetermined pressure; (c) opening said at least one vent once the predetermined pressure is achieved to permit the gas to be expelled from said enclosure; (d) repeating steps (a)-(c) until substantially all the gas above the fluid is expelled from said enclosure; and subsequently (e) dispensing the fluid from the enclosure.
 2. The method of claim 1 wherein said step of determining that substantially all the gas above the fluid is expelled is based at least in part on a calculated rate of change of pressure in said enclosure.
 3. The method of claim 1 wherein said step of increasing the pressure within the enclosure comprises coupling a pressure source to said outlet.
 4. The method of claim 3 wherein said step of increasing the pressure to a predetermined pressure comprises monitoring the pressure of said pressure source.
 5. The method of claim 2, wherein said calculated rate of change of pressure is based on pressure measurements made at at least two different times.
 6. A method for expelling a gas above a fluid in an enclosure in an automated pumping system, said method comprising: (a) closing a vent in said enclosure; (b) increasing the pressure within said enclosure containing the fluid and gas therein to a predetermined pressure; (c) opening said vent once the predetermined pressure is achieved to permit the gas to be expelled from said enclosure; (d) repeating steps (a)-(c) until substantially all the gas above the fluid is expelled from said enclosure; and subsequently (e) dispensing the fluid from the enclosure.
 7. The method of claim 6 wherein said step of determining that substantially all the gas above the fluid is expelled is based at least in part on a calculated rate of change of pressure in said enclosure.
 8. The method of claim 6 wherein said step of increasing the pressure within the enclosure comprises coupling a pressure source to said enclosure.
 9. The method of claim 8 wherein said step of increasing the pressure to a predetermined pressure comprises monitoring the pressure of said pressure source.
 10. The method of claim 7, wherein said calculated rate of change of pressure is based on pressure measurements made at at least two different times. 